SCHEMBL4999934

SCHEMBL4999934

CCO[SiH](CC1=CCCCC1)OCC

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.37
ALOX15 P16050 1/20 0.37
CXCR3 P49682 2/20 0.35
RAB9A P51151 3/20 0.35
GAA P10253 1/20 0.34
KMT2A Q03164 1/20 0.34
MAPT P10636 1/20 0.33
HTT P42858 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PKM P14618 1/20 0.33
SMN1; SMN2 Q16637 3/20 0.33
RECQL P46063 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
LMNA P02545 1/20 0.32
HPGD P15428 1/20 0.32
ALOX12 P18054 1/20 0.32
KDM4E B2RXH2 1/20 0.32
NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4989968 0.82 ALDH1A1 (0.41) ALDH1A1ALOX15RAB9AGAAKMT2A
SCHEMBL5005565 0.81 ALDH1A1 (0.40) ALDH1A1ALOX15CXCR3RAB9AGAA
SCHEMBL3886798 0.80 ALDH1A1 (0.40) ALDH1A1ALOX15RAB9AGAAKMT2A
SCHEMBL177129 0.71
SCHEMBL104937 0.70
SCHEMBL4272343 0.70 ALDH1A1 (0.41) ALDH1A1ALOX15CXCR3RAB9AMAPT
SCHEMBL13084176 0.69 CXCR3 (0.40) ALDH1A1ALOX15CXCR3RAB9AGAA
SCHEMBL5005559 0.69 ALDH1A1 (0.32) ALDH1A1RAB9A
SCHEMBL295859 0.69
SCHEMBL3893406 0.69 ALDH1A1 (0.40) ALDH1A1ALOX15RAB9AGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed