SCHEMBL5010901

SCHEMBL5010901

C=CS(=O)(=O)C=C.C=CS(=O)(=O)C=C.CC(=O)NCC(C)NC(C)=O

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 8/20 0.32
MTNR1B P49286 8/20 0.32
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31
ACACB O00763 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4957302 0.83 MTNR1A (0.40) MTNR1AMTNR1BALDH1A1ACACB
SCHEMBL3143204 0.75 KDM4E (0.46) MTNR1AMTNR1BALDH1A1TSHR
SCHEMBL23223590 0.74 MTNR1A (0.37) MTNR1AMTNR1BALDH1A1TSHR
SCHEMBL20310157 0.72 MTNR1A (0.40) MTNR1AMTNR1BALDH1A1TSHRACACB
SCHEMBL20693686 0.72 MTNR1A (0.36) MTNR1AMTNR1BALDH1A1TSHR
SCHEMBL20694108 0.72 MTNR1A (0.36) MTNR1AMTNR1BALDH1A1TSHR
SCHEMBL23223577 0.72 MTNR1A (0.36) MTNR1AMTNR1BALDH1A1TSHR
SCHEMBL9366857 0.70 MTNR1A (0.38) MTNR1AMTNR1BALDH1A1
SCHEMBL23223761 0.69 MTNR1A (0.34) MTNR1AMTNR1BALDH1A1ACACB
SCHEMBL3144412 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 US disclosed
US-20070254249-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2007-11-01 US disclosed
US-7214476-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
US-7192694-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-03-20 US disclosed
EP-1431813-B1 Photothermographic material with high iodide content and image forming method using same FUJI PHOTO FILM CO LTD (JP) 2007-02-14 EP disclosed
EP-1306720-B1 Heat developable image recording material FUJI PHOTO FILM CO LTD (JP) 2006-12-20 EP disclosed
US-7147999-B2 A photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for a silver ion, a binder on one face of a support, and a compound having a mercaptotriazole or mercaptotetrazole moiety coupled to a reducing group derived from a hydroxyurea or a phenidone; improved sensitivity FUJIFILM CORPORATION (JP) 2006-12-12 US disclosed
US-7144695-B2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2006-12-05 US disclosed
US-7144663-B2 Method and apparatus for liquid preparation of photographic reagent FUJI PHOTO FILM CO., LTD. (JP) 2006-12-05 US disclosed
US-7138223-B2 Photothermographic material FUJI PHOTO FILM CO., LTD. (JP) 2006-11-21 US disclosed
US-20040038161-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-02-26 US disclosed
US-20040033454-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-02-19 US disclosed
US-20040018457-A1 Silver halide photographic emulsion and thermally developable photosensitive material FUJIFILM CORPORATION (JP) 2004-01-29 US disclosed
US-20030232294-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2003-12-18 US disclosed
US-6586171-B1 Cured to some extent by the gelation of the coating film in the chilling-zone process and the first- stage drying in the PAC drying process, then, it is fully dried by the second-stage drying in the HAC drying process, liquid FUJI PHOTO FILM CO., LTD. (JP) 2003-07-01 US disclosed
US-20030108828-A1 Method and apparatus for liquid preparation of photographic reagent FUJI PHOTO FILM CO., LTD. 2003-06-12 US disclosed
US-20030090653-A1 Method and apparatus for inspecting photosensitive material for surface defects FUJI PHOTO FILM CO., LTD. (JP) 2003-05-15 US disclosed
EP-1306720-A2 Heat developable image recording material FUJI PHOTO FILM CO., LTD. (JP) 2003-05-02 EP disclosed
US-20030073046-A1 Method of producing thermal-developable photosensitive material FUJI PHOTO FILM,CO., LTD. (JP) 2003-04-17 US disclosed
EP-1300725-A2 Method of producing thermal-developable photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 2003-04-09 EP disclosed