SCHEMBL5014818

SCHEMBL5014818

C=CC(=O)OCC[Si]1(O)CCCCO1

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.46
ALDH1A1 P00352 4/20 0.46
CYP3A4 P08684 2/20 0.46
TP53 P04637 3/20 0.42
HIF1A Q16665 3/20 0.42
HSD17B10 Q99714 1/20 0.42
HPGD P15428 1/20 0.39
THRB P10828 2/20 0.33
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5014838 0.93 TSHR (0.50) TSHRALDH1A1CYP3A4TP53HIF1A
SCHEMBL7533258 0.77 TSHR (0.49) TSHRALDH1A1CYP3A4TP53HIF1A
SCHEMBL27461420 0.76 TSHR (0.47) TSHRALDH1A1CYP3A4TP53HIF1A
SCHEMBL4075482 0.68 TSHR (0.59) TSHRALDH1A1CYP3A4TP53HIF1A
Tetrahydrofuran SCHEMBL2311865 0.68 TSHR (0.70) TSHRALDH1A1CYP3A4TP53HIF1A
Dioxane SCHEMBL16105710 0.68 TSHR (0.64) TSHRALDH1A1CYP3A4TP53HIF1A
SCHEMBL2492479 0.67 TSHR (0.76) TSHRALDH1A1CYP3A4TP53HIF1A
SCHEMBL28821508 0.67 TSHR (0.52) TSHRALDH1A1CYP3A4TP53HIF1A
Propene SCHEMBL6402695 0.67
SCHEMBL244114 0.67 TSHR (0.95) TSHRALDH1A1CYP3A4TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9115277-B2 Porous polyolefin resin film MITSUBISHI PLASTICS, INC. (JP) 2015-08-25 US disclosed
US-20130236793-A1 POROUS POLYOLEFIN RESIN FILM MITSUBISHI PLASTICS, INC. (JP) 2013-09-12 US disclosed
EP-2626380-A1 POROUS POLYOLEFIN RESIN FILM Mitsubishi Plastics, Inc. (JP) 2013-08-14 EP disclosed
US-7393911-B2 Organosilicon fine particles and method of producing same TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2008-07-01 US disclosed
US-20060089478-A1 antireflection and antiblocking characteristics to synthetic polymer films and sheets when applied to their surface or caused to be contained, respectively, and adherence and slip characteristics to a skin care cosmetic material when caused to be contained TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2006-04-27 US disclosed