Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 6/20 | 0.72 |
| ▸ | MEN1 | O00255 | 2/20 | 0.72 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.63 |
| ▸ | HPGD | P15428 | 1/20 | 0.61 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.60 |
| ▸ | LTA4H | P09960 | 1/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | DRD2 | P14416 | 1/20 | 0.57 |
| ▸ | DRD1 | P21728 | 1/20 | 0.57 |
| ▸ | DRD3 | P35462 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.56 |
| ▸ | ATM | Q13315 | 1/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | THPO | P40225 | 1/20 | 0.56 |
| ▸ | SCN1A | P35498 | 1/20 | 0.56 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.56 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8624619 | 0.98 | KMT2A (0.70) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| SCHEMBL501868 | 0.98 | KMT2A (0.75) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| Water SCHEMBL8479966 | 0.97 | KMT2A (0.73) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| Hydrochloric Acid SCHEMBL8481680 | 0.97 | KMT2A (0.73) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| SCHEMBL501795 | 0.91 | KMT2A (0.69) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| SCHEMBL501887 | 0.90 | KMT2A (0.72) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| SCHEMBL8355590 | 0.89 | CYP2D6 (0.76) | KMT2AMEN1CYP2D6TDP1DRD3 | |
| Hydrochloric Acid SCHEMBL8622970 | 0.88 | CYP2D6 (0.74) | KMT2AMEN1NPSR1HPGDCYP2D6 | |
| SCHEMBL2663560 | 0.87 | HRH3 (0.71) | KMT2AMEN1NPSR1TDP1DRD3 | |
| SCHEMBL501720 | 0.86 | ATM (0.76) | KMT2AMEN1HPGDCYP2D6ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8431323-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| EP-2033966-A2 | Movel photoacid generators, resist compositons, and patterning processes | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-7276324-B2 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-02 | — | — | US | disclosed |
| US-20050106500-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-05-19 | — | — | US | disclosed |
| US-5962698-A | PLASMINOGEN ACTIVATOR INHIBITOR | ELI LILLY AND COMPANY (US) | 1999-10-05 | — | — | US | disclosed |
| US-5958969-A | OSTEOPOROSIS | ELI LILLY AND COMPANY (US) | 1999-09-28 | — | — | US | disclosed |
| US-5948795-A | PLASMINOGEN ACTIVATOR INHIBITOR | ELI LILLY AND COMPANY (US) | 1999-09-07 | — | — | US | disclosed |
| US-5827853-A | MIXTURE CONTAINING PRODUCT FROM FERMENTATION BY STREPTOMYCES FOR TOPICAL APPLICATION TO SKIN OR HAIR, TO IMPROVE TEXTURE, SURFACE SMOOTHNESS, FIRMNESS | SANOFI (FR) | 1998-10-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | KMT2A 3509/4885MEN1 718/4885NPSR1 958/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.