SCHEMBL5019004

SCHEMBL5019004

[C-]#[N+]c1ccc(O)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10295281 0.92 ESR1 (0.58)
Biphenyl SCHEMBL11354502 0.83 MMP3 (0.58)
SCHEMBL11354504 0.80 TDP1 (0.39)
Hydroquinone SCHEMBL11511669 0.71 ALOX15 (1.00)
Hydroquinone SCHEMBL15516 0.71
Hydroquinone SCHEMBL460669 0.71 ALOX15 (1.00)
SCHEMBL2706567 0.69 APP (0.43)
SCHEMBL11790422 0.69 HDAC3 (0.40)
SCHEMBL1106601 0.69
SCHEMBL998605 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240246905-A1 VINYL ISOCYANIDE COMPOUNDS AS ANTIBACTERIAL AGENTS UNIVERSITY OF LEICESTER (GB) 2024-07-25 US disclosed
EP-4337635-A1 VINYL ISOCYANIDE COMPOUNDS AS ANTIBACTERIAL AGENTS University of Leicester (GB) 2024-03-20 EP disclosed
US-11915925-B2 Semiconductor device manufacturing method DAICEL CORPORATION (JP) 2024-02-27 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11876181-B2 Lithium ion battery electrolyte additive NOHMs Technologies, Inc. (US) 2024-01-16 US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20230322747-A1 OXADIAZOLE HDAC6 INHIBITORS AND USES THEREOF EIKONIZO THERAPEUTICS, INC. (US) 2023-10-12 US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230287272-A1 LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DEVICE DIC CORPORATION (JP) 2023-09-14 US disclosed
US-7431971-B2 Retardation plate FUJIFILM CORPORATION (JP) 2008-10-07 US disclosed
US-20080193679-A1 Optical anisotropic layer FUJIFILM CORPORATION (JP) 2008-08-14 US disclosed
US-7390825-B1 Process for the preparation of oxazolidinones and method of use thereof BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY (US) 2008-06-24 US disclosed
US-20080146458-A1 PROCESS FOR THE PREPARATION OF OXAZOLIDINONES AND METHOD OF USE THEREOF BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY (US) 2008-06-19 US disclosed
US-20080125596-A1 Process For Preparing N-Hydroxy-4--Benzamidine DONG WHA PHARMACEUTICAL CO., LTD. (KR) 2008-05-29 US disclosed
US-20080064879-A1 Compound ,Composition And Thin Film FUJIFILM CORPORATION (JP) 2008-03-13 US disclosed
US-20080023108-A1 METHOD OF FLUXING USING A FLUXING COMPOSITION CONTAINING COMPOUNDS WITH AN AROMATIC RING AND NO IMINO GROUP NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) 2008-01-31 US disclosed
US-20070265451-A1 Process for the preparation of oxazolidinones and method of use thereof BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY (US) 2007-11-15 US disclosed
US-7291617-B2 Arylamidine derivative or salt thereof TOYAMA CHEMICAL CO., LTD. (JP) 2007-11-06 US disclosed
US-7244849-B2 Process for preparing a thiazole PPAR-ligand and polymorphs thereof GLAXO GROUP LIMITED (GB) 2007-07-17 US disclosed