Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.59 |
| ▸ | EP300 | Q09472 | 2/20 | 0.46 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.46 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.46 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.46 |
| ▸ | CTSL | P07711 | 4/20 | 0.46 |
| ▸ | CAPN1 | P07384 | 3/20 | 0.46 |
| ▸ | CTSB | P07858 | 3/20 | 0.46 |
| ▸ | GCGR | P47871 | 3/20 | 0.41 |
| ▸ | LDHA | P00338 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | APP | P05067 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | SNCA | P37840 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formamide SCHEMBL9732415 | 0.90 | IDO1 (0.48) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL92353 | 0.86 | IDO1 (0.46) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL2100602 | 0.85 | ALDH1A1 (0.48) | IDO1CYP1A2MAPTTHRBHPGD | |
| SCHEMBL29434197 | 0.85 | ALDH1A1 (0.48) | IDO1CYP1A2MAPTTHRBHPGD | |
| SCHEMBL4017834 | 0.82 | CYP1A2 (0.57) | IDO1CYP1A2 | |
| SCHEMBL7708552 | 0.81 | IDO1 (0.65) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL3459911 | 0.79 | IDO1 (0.50) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL3459912 | 0.79 | IDO1 (0.50) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL20930329 | 0.79 | ESR2 (0.38) | IDO1APPMAPTTHRBHPGD | |
| SCHEMBL21169965 | 0.78 | HPGD (0.58) | IDO1CYP1A2APPMAPTTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119955197-A | Water permeable floor for upgrading renewable resources of wind power generation blades | 济南市阿波罗木塑复合材料有限公司 | 2025-05-09 | — | — | CN | claimed |
| US-12449731-B2 | Photosensitive resin composition, method for producing resist pattern film, and method for producing plated formed product | ISR CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| CN-119955197-A | Water permeable floor for upgrading renewable resources of wind power generation blades | 济南市阿波罗木塑复合材料有限公司 | 2025-05-09 | — | — | CN | disclosed |
| US-20250147418-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2025-05-08 | — | — | US | disclosed |
| WO-2025041686-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041685-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-12174538-B2 | Photosensitive resin composition, method for producing resist pattern film, method for producing plated formed product, and method for producing tin-silver plated-formed product | JSR CORPORATION (JP) | 2024-12-24 | — | — | US | disclosed |
| CN-112534353-B | Photosensitive resin composition, method for forming resist pattern, method for producing plated molded article, and semiconductor device | JSR株式会社 | 2024-12-24 | — | — | CN | disclosed |
| US-12158700-B2 | Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus | JSR CORPORATION (JP) | 2024-12-03 | — | — | US | disclosed |
| WO-2024190595-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2024-09-19 | — | — | WO | disclosed |
| EP-1845416-A2 | Coating compositions for photolithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238052-A1 | Coating compositions for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-10-11 | — | — | US | disclosed |
| US-20070122740-A1 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070122740-A1 | Resist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| US-4517354-A | PROTECTIVE COATINGS | PLASTICS ENGINEERING COMPANY (US) | 1985-05-14 | — | — | US | disclosed |