Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.44 |
| ▸ | RECQL | P46063 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | APP | P05067 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | SNCA | P37840 | 1/20 | 0.44 |
| ▸ | CDK2 | P24941 | 2/20 | 0.41 |
| ▸ | ERN1 | O75460 | 1/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4017834 | 0.90 | CYP1A2 (0.57) | IDO1CYP1A2RAB9AKDM4EPOLB | |
| SCHEMBL501996 | 0.86 | IDO1 (0.59) | IDO1HPGDHSD17B10CYP1A2ALOX15 | |
| SCHEMBL1554672 | 0.85 | ALDH1A1 (0.48) | HPGDHSD17B10CYP1A2TDP1THRB | |
| SCHEMBL29434190 | 0.85 | ALDH1A1 (0.48) | HPGDHSD17B10CYP1A2TDP1THRB | |
| SCHEMBL4019967 | 0.83 | CYP1A2 (0.40) | IDO1HPGDHSD17B10CYP1A2ALOX15 | |
| SCHEMBL11963904 | 0.81 | ESR2 (0.43) | IDO1HPGDHSD17B10ALOX15RECQL | |
| SCHEMBL15900346 | 0.79 | CYP1A2 (0.54) | CYP1A2ESR2RAB9AKDM4EPOLB | |
| SCHEMBL4199563 | 0.79 | GRIN2D (0.44) | IDO1CYP1A2MAPTESR2ALDH1A1 | |
| SCHEMBL11963901 | 0.79 | NQO2 (0.44) | IDO1CDK2ESR2ALDH1A1RAB9A | |
| SCHEMBL21169965 | 0.78 | HPGD (0.58) | IDO1HPGDHSD17B10CYP1A2ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 364 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109072043-B | Allergen activity reducing agent composition | 太阳星光齿磨公司 | 2021-07-30 | — | — | CN | claimed |
| CN-109072043-A | Allergenic activity depressant composition | 太阳星光齿磨公司 | 2018-12-21 | — | — | CN | claimed |
| US-11817316-B2 | Coating compositions and methods of forming electronic devices | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-14 | — | — | US | disclosed |
| US-11817316-B2 | Coating compositions and methods of forming electronic devices | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-14 | — | — | US | disclosed |
| US-11801333-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| WO-2022244814-A1 | FUNCTIONAL ARTICLE, ACTIVE INGREDIENT CONFIRMATION METHOD, AND COATING LIQUID | 積水マテリアルソリューションズ株式会社 | 2022-11-24 | — | — | WO | disclosed |
| US-11208509-B2 | Polymer compound for conductive polymer and method for producing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-28 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0234710-B1 | HOT MELT ADHESIVES CONTAINING A NOVEL ADHESIVE ADDITIVE | H.B. FULLER LICENSING & FINANCING, INC. (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5071914-A | Thermoplastic hot melt adhesive containing epoxy adduct | H. B. FULLER COMPANY (US) | 1991-12-10 | — | — | US | disclosed |
| US-4871803-A | BLEND CONTAINING TACKIFIER RESIN | Fuller, H. B. (US) | 1989-10-03 | — | — | US | disclosed |
| EP-0234710-A2 | Hot melt adhesives containing a novel adhesive additive | H.B. FULLER LICENSING & FINANCING, INC. (US) | 1987-09-02 | — | — | EP | disclosed |