Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 4/20 | 0.50 |
| ▸ | CTSL | P07711 | 5/20 | 0.49 |
| ▸ | CAPN1 | P07384 | 4/20 | 0.49 |
| ▸ | CTSB | P07858 | 4/20 | 0.49 |
| ▸ | EP300 | Q09472 | 2/20 | 0.41 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.41 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.41 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.41 |
| ▸ | LDHA | P00338 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | GCGR | P47871 | 3/20 | 0.38 |
| ▸ | CDK4 | P11802 | 1/20 | 0.37 |
| ▸ | CCND1 | P24385 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3459911 | 1.00 | IDO1 (0.50) | IDO1CTSLCAPN1CTSBEP300 | |
| SCHEMBL501996 | 0.79 | IDO1 (0.59) | IDO1CTSLCAPN1CTSBEP300 | |
| SCHEMBL27558135 | 0.75 | CDK4 (0.63) | KDM4ECDK4CCND1 | |
| SCHEMBL19970163 | 0.75 | CDK4 (0.63) | KDM4ECDK4CCND1 | |
| SCHEMBL7708552 | 0.74 | IDO1 (0.65) | IDO1CTSLCAPN1CTSBEP300 | |
| SCHEMBL17066485 | 0.73 | CTSL (0.46) | IDO1CTSLCAPN1CTSBEP300 | |
| SCHEMBL490083 | 0.72 | RXRA (0.50) | KDM4E | |
| SCHEMBL490085 | 0.72 | RXRA (0.50) | KDM4E | |
| SCHEMBL30493441 | 0.72 | RXRA (0.50) | KDM4E | |
| SCHEMBL16048249 | 0.72 | CTSL (0.64) | IDO1CTSLCAPN1CTSBHDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9989853-B2 | — | — | 2018-06-05 | — | — | US | disclosed |
| US-20160291472-A1 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-10-06 | — | — | US | disclosed |
| US-20160282721-A1 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-09-29 | — | — | US | disclosed |
| US-20160011511-A1 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-01-14 | — | — | US | disclosed |
| US-20160005625-A1 | Hardmask composition and method of forming pattern using the hardmask composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2016-01-07 | — | — | US | disclosed |
| US-7659051-B2 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2010-02-09 | — | — | US | disclosed |
| US-7659051-B2 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2010-02-09 | — | — | US | disclosed |
| US-7659051-B2 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2010-02-09 | — | — | US | disclosed |
| WO-2008082236-A1 | POLYMER HAVING ANTIREFLECTIVE PROPERTIES, HARDMASK COMPOSITION INCLUDING THE SAME, AND PROCESS FOR FORMING A PATTERNED MATERIAL LAYER | CHEIL INDUSTRIES INC. (KR) | 2008-07-10 | — | — | WO | disclosed |
| US-20080160460-A1 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2008-07-03 | — | — | US | disclosed |
| US-20080160460-A1 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2008-07-03 | — | — | US | disclosed |
| US-20080160460-A1 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | CHEIL INDUSTRIES, INC. (KR) | 2008-07-03 | — | — | US | disclosed |