⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5401371 | 0.82 | — | — | |
| SCHEMBL5406892 | 0.80 | OPRM1 (0.31) | — | |
| SCHEMBL5408942 | 0.79 | OPRM1 (0.33) | — | |
| SCHEMBL5401444 | 0.73 | CALM1 (0.35) | — | |
| SCHEMBL5405489 | 0.71 | — | — | |
| SCHEMBL1956522 | 0.68 | HTR1A (0.30) | — | |
| SCHEMBL14890212 | 0.68 | — | — | |
| SCHEMBL13255130 | 0.68 | HTR1A (0.30) | — | |
| SCHEMBL20608598 | 0.68 | HTR1A (0.30) | — | |
| SCHEMBL2385718 | 0.68 | HTR1A (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | claimed |
| US-7241552-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-10 | — | — | US | claimed |
| US-7045267-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-16 | — | — | US | claimed |
| US-20050008975-A1 | Chemical resistance; bonding strength; accuracte patterns; photolithography | YOON KWANG-SUB (KR) | 2005-01-13 | — | — | US | claimed |
| US-6517990-B1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-02-11 | — | — | US | claimed |
| WO-2023157901-A1 | COPOLYMER OF HYDROXYSTYRENE-BASED MONOMER AND (METH)ACRYLIC ACID ESTER-BASED MONOMER, AND METHOD FOR PRODUCING SAME | 丸善石油化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20050095533-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-05-05 | — | — | US | disclosed |
| US-20040067436-A1 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-6517990-B1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-02-11 | — | — | US | disclosed |