SCHEMBL5022795

SCHEMBL5022795

CC(C)[Si](C(C)C)(C(C)C)C([Si](C(C)C)(C(C)C)C(C)C)(S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5016880 0.70 ALDH1A1 (0.36)
Sulfuric Acid SCHEMBL14697902 0.70 CA5A (0.32)
SCHEMBL5014935 0.69
SCHEMBL28791806 0.69
SCHEMBL5022870 0.67
SCHEMBL4300078 0.67 CA5A (0.31)
Trifluoromethanesulfonic Acid SCHEMBL8817892 0.63 CA1 (0.40)
Sulfuric Acid SCHEMBL833019 0.61 CA5A (0.50)
Sulfuric Acid SCHEMBL833021 0.61
SCHEMBL3132836 0.61 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404389-B2 solvent of the electrolytic solution contains a sulfone compound such as or bis(trimethylsilyl)methanedisulfonate or other sulfonate-silane compounds; chemical stability of the electrolytic solution is improved SONY CORPORATION (JP) 2013-03-26 US disclosed
US-20080138715-A1 ELECTROLYTIC SOLUTION AND BATTERY SONY CORPORATION (JP) 2008-06-12 US disclosed