Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.55 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | HSD17B1 | P14061 | 3/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
| ▸ | DHFR | P00374 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.35 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1023740 | 0.86 | PTPN1 (0.55) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL30250589 | 0.85 | CA1 (0.59) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL31028130 | 0.85 | CA1 (0.59) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL9749694 | 0.85 | CA1 (0.59) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL18159476 | 0.84 | PRKCE (0.47) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL15459274 | 0.84 | PRKCE (0.47) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL15495702 | 0.84 | PRKCE (0.47) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL13895963 | 0.84 | TYR (0.46) | GABRA1GABRB2CYP3A4ALOX15DHFR | |
| SCHEMBL26249015 | 0.82 | GABRA1 (0.40) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL69820 | 0.82 | GABRA1 (0.55) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024005194-A1 | POLYPHENOL COMPOUND, FILM-FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | 三菱瓦斯化学株式会社 | 2024-01-04 | — | — | WO | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9315435-B2 | Method for producing hydroxyphenylcyclohexanol compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-04-19 | — | — | US | disclosed |
| US-9235116-B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20150141707-A1 | METHOD FOR PRODUCING HYDROXYPHENYLCYCLOHEXANOL COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2842930-A1 | METHOD FOR PRODUCING HYDROXYPHENYLCYCLOHEXANOL COMPOUND | Sumitomo Chemical Company Limited (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-8906592-B2 | Antireflective coating composition and process thereof | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-12-09 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140272692-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN | FUJIFILM CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| EP-0403022-A2 | Encapsulating epoxy resin composition | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1990-12-19 | — | — | EP | disclosed |
| EP-0155517-B1 | POLYESTER COMPOSITION AND PROCESS FOR PRODUCING SHAPED ARTICLES USING SAME | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1990-04-25 | — | — | EP | disclosed |
| US-H506-H | AROMATIC POLYESTERS, HEAT RESISTANCE | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-08-02 | — | — | US | disclosed |
| US-4623710-A | HEAT RESISTANCE, TRANSPARENCY, SURFACE RESISTANCE | Kanegafuchi Kagaku Kogyo Kubushiki Kaisha (JP) | 1986-11-18 | — | — | US | disclosed |
| EP-0196528-A2 | Aromatic polyester film having silicone resin layer and liquid crystal display panel made therof | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1986-10-08 | — | — | EP | disclosed |
| EP-0093891-B1 | HEAT-RESISTING AROMATIC POLYESTER AND PROCESS FOR PREPARING THE SAME | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1986-07-02 | — | — | EP | disclosed |
| EP-0171063-A2 | Aromatic polyester films | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1986-02-12 | — | — | EP | disclosed |
| US-4552947-A | Heat-resisting aromatic polyester and process for preparing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-11-12 | — | — | US | disclosed |
| EP-0155517-A2 | Polyester composition and process for producing shaped articles using same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-09-25 | — | — | EP | disclosed |
| EP-0093891-A1 | Heat-resisting aromatic polyester and process for preparing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1983-11-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150141707-A1 | METHOD FOR PRODUCING HYDROXYPHENYLCYCLOHEXANOL COMPOUND | HSD11B2, CYP21A2, CYP11B2 | GABRA1 1252/4885GABRB2 835/4885CYP1A2 17/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.