Iodide

Iodide

SCHEMBL5026630

CCc1ccc(C(C)N)c(CC)c1CC.I

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.34
▸ TP53 P04637 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ PDE2A O00408 1/20 0.31
▸ TAAR1 Q96RJ0 1/20 0.31
▸ CYP1A2 P05177 1/20 0.31
▸ CYP3A4 P08684 1/20 0.31
▸ CYP2D6 P10635 1/20 0.31
▸ NFKB1 P19838 1/20 0.31
▸ PNMT P11086 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL9711083 0.96 LMNA (0.34) LMNATP53HTTPDE2ATAAR1
Bromide SCHEMBL5088439 0.96 LMNA (0.34) LMNATP53HTTPDE2ATAAR1
Hydrochloric Acid SCHEMBL5092759 0.96 LMNA (0.34) LMNATP53HTTPDE2ATAAR1
SCHEMBL9064419 0.81 GABRA1 (0.40) LMNAHTTTAAR1CYP1A2CYP3A4
SCHEMBL22558408 0.80 CYP1A2 (0.42) LMNAHTTTAAR1CYP1A2CYP3A4
SCHEMBL166573 0.75 GABRA1 (0.41) TP53HTTTAAR1
SCHEMBL29619533 0.75 GABRA1 (0.41) TP53HTTTAAR1
SCHEMBL22589011 0.73 LMNA (0.35) LMNATP53HTTPDE2ATAAR1
Ammonia Solution, Strong SCHEMBL27539208 0.72 GABRA1 (0.39) TP53HTTTAAR1
SCHEMBL21343570 0.72 GABRA1 (0.45) LMNATP53HTTTAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008036454-A1 POLY (ARYLENE ETHER) COPOLYMER SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2008-03-27 — — WO disclosed
US-20080054234-A1 Flame retardative resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2008-03-06 — — US disclosed
US-7084194-B2 Halogen-free resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2006-08-01 — — US disclosed
US-6900269-B2 Halogen-free resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2005-05-31 — — US disclosed
US-20040254305-A1 Epoxy resin composition for photosemiconductor package CHANG CHUN PLASTIC CO., LTD. (TW) 2004-12-16 — — US disclosed
US-20040158023-A1 Halogen-free resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2004-08-12 — — US disclosed
US-20040147640-A1 Halogen-free resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2004-07-29 — — US disclosed
US-20040077821-A1 Flame retarding resin composition CHANG CHUN PLASTICS CO., LTD. (TW) 2004-04-22 — — US disclosed
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