⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6451913 | 0.90 | CES2 (0.34) | — | |
| SCHEMBL3512719 | 0.82 | — | — | |
| SCHEMBL15402656 | 0.74 | — | — | |
| SCHEMBL866215 | 0.72 | CES2 (0.46) | — | |
| SCHEMBL3419320 | 0.70 | — | — | |
| SCHEMBL959689 | 0.70 | CES2 (0.56) | — | |
| SCHEMBL35782 | 0.69 | — | — | |
| SCHEMBL246957 | 0.69 | — | — | |
| SCHEMBL16047172 | 0.69 | — | — | |
| SCHEMBL9048493 | 0.67 | CES2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| WO-2023100574-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND | JSR株式会社 | 2023-06-08 | — | — | WO | disclosed |
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-10331031-B2 | Resin composition, resist pattern-forming method and polymer | JSR CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20180329298-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-11-15 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| US-9874816-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| EP-2842937-B1 | AMINE COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES | MITSUBISHI TANABE PHARMA CORP (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-20170363961-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| US-20150323866-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150323870-A1 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-11-12 | — | — | US | disclosed |
| US-9146466-B2 | Resist composition, resist pattern-forming method, and resist solvent | JSR CORPORATION (JP) | 2015-09-29 | — | — | US | disclosed |
| US-20150253663-A1 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150253671-A1 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150093703-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-20150087620-A1 | AMINE COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES | MITSUBISHI TANABE PHARMA CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| EP-2842937-A1 | AMINE COMPOUND AND USE THEREOF FOR MEDICAL PURPOSES | Mitsubishi Tanabe Pharma Corporation (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-20140302438-A1 | RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT | JSR CORPORATION (JP) | 2014-10-09 | — | — | US | disclosed |
| US-20080318108-A1 | Solid Electrolyte, Membrane and Electrode Assembly, and Fuel Cell | FUJIFILM CORPORATION | 2008-12-25 | — | — | US | disclosed |