SCHEMBL5028672

SCHEMBL5028672

Oc1ccc(C23CC4CC(CC(C4)C2)C3)c(F)c1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.43
MEN1 O00255 3/20 0.43
GAA P10253 2/20 0.43
POLB P06746 1/20 0.43
GFER P55789 1/20 0.43
CNR2 P34972 2/20 0.42
RARB P10826 4/20 0.38
RARA P10276 2/20 0.38
RARG P13631 2/20 0.38
MAPT P10636 2/20 0.37
KDM4E B2RXH2 1/20 0.37
ALDH1A1 P00352 1/20 0.37
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
ALOX12 P18054 1/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HSD17B10 Q99714 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2420330 0.81 MEN1 (0.50) KMT2AMEN1GAAPOLBGFER
SCHEMBL27419643 0.79 CNR2 (0.48) KMT2AMEN1GAAPOLBGFER
SCHEMBL8024133 0.79 MEN1 (0.43) KMT2AMEN1GAAPOLBGFER
SCHEMBL3755595 0.78 MEN1 (0.55) KMT2AMEN1GAAPOLBGFER
SCHEMBL8766363 0.75 MEN1 (0.43) KMT2AMEN1GAAPOLBGFER
SCHEMBL27829414 0.75 MEN1 (0.46) KMT2AMEN1GAAPOLBGFER
Formic Acid SCHEMBL28092830 0.75 RARB (0.44) KMT2AMEN1GAAPOLBGFER
SCHEMBL548996 0.74 MEN1 (0.48) KMT2AMEN1GAAPOLBGFER
SCHEMBL24559595 0.73 MEN1 (0.49) KMT2AMEN1GAAPOLBGFER
SCHEMBL22644225 0.73 MEN1 (0.49) KMT2AMEN1GAAPOLBGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
CN-101128514-B Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO 2011-05-25 CN disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
CN-101128514-A Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-02-20 CN disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed