Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNMA1 | Q12791 | 5/20 | 0.68 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 7/20 | 0.50 |
| ▸ | NPC1 | O15118 | 5/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | TP53 | P04637 | 3/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | RAB9A | P51151 | 3/20 | 0.49 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5033736 | 0.89 | NPC1 (0.54) | KCNMA1GAANPC1MAPTSMN1; SMN2 | |
| SCHEMBL6029542 | 0.88 | KCNMA1 (0.84) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL2605548 | 0.86 | KCNMA1 (0.82) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL14154080 | 0.83 | KCNMA1 (0.64) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL14363236 | 0.83 | KCNMA1 (0.77) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL5039454 | 0.83 | KCNMA1 (0.68) | KCNMA1HDAC1NPC1TP53RAB9A | |
| SCHEMBL19927859 | 0.82 | HDAC2 (0.54) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL10873010 | 0.80 | KCNMA1 (1.00) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL14363234 | 0.80 | KCNMA1 (0.72) | KCNMA1HDAC1GAANPC1MAPT | |
| SCHEMBL7300963 | 0.79 | KCNMA1 (0.71) | KCNMA1HDAC1GAANPC1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7439005-B2 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134586-A1 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | NEC CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |