SCHEMBL5033736

SCHEMBL5033736

C=Cc1ccc(C(=O)Nc2ccc(C)cc2O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 5/20 0.54
GAA P10253 4/20 0.54
RAB9A P51151 4/20 0.54
SMN1; SMN2 Q16637 3/20 0.54
KCNMA1 Q12791 2/20 0.52
MAPT P10636 3/20 0.49
KMT2A Q03164 5/20 0.49
MEN1 O00255 3/20 0.49
ALDH1A1 P00352 2/20 0.49
HTT P42858 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
CXCR2 P25025 1/20 0.47
APP P05067 1/20 0.47
HDAC2 Q92769 1/20 0.46
HPGD P15428 1/20 0.45
TAS1R3 Q7RTX0 1/20 0.45
TAS1R1 Q7RTX1 1/20 0.45
TAS1R2 Q8TE23 1/20 0.45
LMNA P02545 1/20 0.44
AHR P35869 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5031608 0.89 KCNMA1 (0.68) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL21360977 0.86 NPC1 (0.64) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL19927859 0.84 HDAC2 (0.54) NPC1GAARAB9AKCNMA1MAPT
SCHEMBL18719150 0.82 NPC1 (0.59) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL28734380 0.81 KMT2A (0.67) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL11331448 0.80 KCNMA1 (0.77) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL7292413 0.79 HSD17B2 (0.58) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL5034820 0.79 NPC1 (0.64) NPC1GAARAB9AKMT2AMEN1
SCHEMBL3404621 0.78 GAA (0.62) NPC1GAARAB9ASMN1; SMN2KCNMA1
SCHEMBL4544559 0.78 GAA (0.66) NPC1GAARAB9ASMN1; SMN2KCNMA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed