Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL525795 | 0.83 | KDM4E (0.50) | KDM4ETSHRTDP1 | |
| SCHEMBL16706058 | 0.81 | KDM4E (0.41) | KDM4ETSHRTDP1 | |
| SCHEMBL503851 | 0.80 | — | — | |
| SCHEMBL22882236 | 0.79 | — | — | |
| SCHEMBL5425990 | 0.77 | KDM4E (0.48) | KDM4ETSHRTDP1 | |
| SCHEMBL498059 | 0.75 | KDM4E (0.43) | KDM4ETSHRTDP1 | |
| SCHEMBL503427 | 0.73 | — | — | |
| SCHEMBL5489726 | 0.72 | TSHR (0.42) | KDM4ETSHRTDP1 | |
| SCHEMBL1824498 | 0.72 | TSHR (0.42) | KDM4ETSHRTDP1 | |
| SCHEMBL1824897 | 0.72 | TSHR (0.42) | KDM4ETSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023238764-A1 | COMPOSITION, FILM, ORGANIC PHOTOELECTRIC CONVERSION ELEMENT, AND PHOTODETECTION ELEMENT | 住友化学株式会社 | 2023-12-14 | — | — | WO | disclosed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| CN-103649217-B | Curable epoxy resin composition | 株式会社大赛璐 | 2017-02-15 | — | — | CN | disclosed |
| CN-103649218-B | Curable epoxy resin composition | DAICEL CORP. (JP) | 2016-05-11 | — | — | CN | disclosed |
| US-9233919-B2 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20140296561-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | SHINETSU CHEMICAL CO (JP) | 2014-10-02 | — | — | US | disclosed |
| CN-103649217-A | Curable epoxy resin composition | DAICEL CORPORTATION | 2014-03-19 | — | — | CN | disclosed |
| CN-103649218-A | Curable epoxy resin composition | DAICEL CORP | 2014-03-19 | — | — | CN | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| CN-101031597-A | Copolymer and composition for forming upper layer film | JSR CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-5235013-A | Copolymerizing an alkene of 6-10 carbons having one double bond and a side chain methyl group and an acrylic or fluoroacrylic ester | CIBA-GEIGY CORPORATION | 1993-08-10 | — | — | US | disclosed |
| EP-0478261-A2 | Process for producing oxygen-permeable polymer | CIBA-GEIGY AG (CH) | 1992-04-01 | — | — | EP | disclosed |
| EP-0226020-A2 | Plastic optical fibers and transparent resin used therefor | HITACHI, LTD. (JP) | 1987-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140296561-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | RER1, SMC4, SMCHD1 | KDM4E 1227/4885TSHR 3516/4885TDP1 1727/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.