Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1824587 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL503557 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL5485467 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL503323 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL5489780 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL5483220 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL384855 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL5490351 | 1.00 | KDM4E (0.34) | KDM4ETSHRTDP1 | |
| SCHEMBL444237 | 0.97 | KDM4E (0.36) | KDM4ETSHRTDP1 | |
| SCHEMBL145339 | 0.88 | KDM4E (0.37) | KDM4ETSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9158191-B2 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| US-8501389-B2 | Upper layer-forming composition and resist patterning method | JSR CORPORATION (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20130149493-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-13 | — | — | US | disclosed |
| EP-2602660-A1 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-20070087287-A1 | Amine compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-04-19 | — | — | US | disclosed |
| EP-1222237-B1 | MATERIALS FOR INDUCING ALIGNMENT IN LIQUID CRYSTALS AND LIQUID CRYSTAL DISPLAYS | ELSICON INC (US) | 2007-04-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-6713135-B2 | BRANCHED POLYIMIDE, POLYAMIC ACIDS | ELSICON, INC. | 2004-03-30 | — | — | US | disclosed |
| US-6380432-B2 | AROMATIC DIAMINES USEFUL IN PREPARING POLYIMIDES | ELSICON INC. | 2002-04-30 | — | — | US | disclosed |
| US-20010039361-A1 | Materials for inducing alignment in liquid crystal and liquid crystal displays | GIBBONS WAYNE M (US) | 2001-11-08 | — | — | US | disclosed |
| US-20010018099-A1 | Materials for inducing alignment in liquid crystals and liquid crystal displays | ELSICON, INC. | 2001-08-30 | — | — | US | disclosed |
| US-6242061-B1 | POLYAMIC ACIDS, POLYIMIDES | ELSICON INC. | 2001-06-05 | — | — | US | disclosed |
| US-6194039-B1 | POLYIMIDES, POLYAMIC ACIDS | ELSICON, INC. | 2001-02-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20010039361-A1 | Materials for inducing alignment in liquid crystal and liquid crystal displays | DYNC1LI1, DYNC1LI2, DYNLL1 | KDM4E 1282/4885TSHR 4719/4885TDP1 2203/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.