Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD2 | P14416 | 2/20 | 0.32 |
| ▸ | DRD3 | P35462 | 2/20 | 0.32 |
| ▸ | HTR1D | P28221 | 1/20 | 0.32 |
| ▸ | DRD4 | P21917 | 1/20 | 0.32 |
| ▸ | HTR5A | P47898 | 1/20 | 0.32 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2895999 | 0.82 | CA2 (0.41) | — | |
| SCHEMBL66020 | 0.81 | DRD2 (0.40) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL3696269 | 0.81 | CA2 (0.42) | — | |
| SCHEMBL6550061 | 0.79 | DRD2 (0.34) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL7641839 | 0.75 | DRD2 (0.32) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL8776806 | 0.73 | ELANE (0.31) | ELANE | |
| SCHEMBL20943735 | 0.72 | DRD2 (0.38) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL4686314 | 0.70 | EPAS1 (0.38) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL17310208 | 0.70 | DRD2 (0.36) | DRD2DRD3HTR1DDRD4HTR5A | |
| SCHEMBL1712822 | 0.69 | CA2 (0.41) | DRD2DRD3HTR1D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |