SCHEMBL8776806

SCHEMBL8776806

O=S(=O)(Oc1cccc(OS(=O)(=O)C(Cl)(Cl)Cl)c1OS(=O)(=O)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.31
METAP2 P50579 1/20 0.30
METAP1 P53582 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL66020 0.79 DRD2 (0.40)
SCHEMBL27593422 0.78 LMNA (0.41) ELANE
SCHEMBL6550061 0.78 DRD2 (0.34) ELANE
SCHEMBL503479 0.73 DRD2 (0.32) ELANE
SCHEMBL7641839 0.73 DRD2 (0.32) ELANE
SCHEMBL2895999 0.73 CA2 (0.41)
SCHEMBL4686314 0.72 EPAS1 (0.38)
SCHEMBL3696269 0.72 CA2 (0.42)
SCHEMBL9638233 0.71 CA2 (0.54)
SCHEMBL20943735 0.71 DRD2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5470996-A Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1995-11-28 US claimed
US-5118582-A PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME HITACHI, LTD. (JP) 1992-06-02 US claimed
EP-0388813-B1 Pattern forming material and process for forming pattern using the same HITACHI LTD (JP) 1997-12-10 EP disclosed
US-5470996-A Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1995-11-28 US disclosed
US-5118582-A PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME HITACHI, LTD. (JP) 1992-06-02 US disclosed
EP-0388813-A2 Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1990-09-26 EP disclosed