Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1218862 | 0.77 | ALDH1A1 (0.40) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL1219029 | 0.75 | MEN1 (0.43) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL5668285 | 0.75 | MEN1 (0.43) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL2409328 | 0.73 | ALDH1A1 (0.42) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL5613623 | 0.72 | SMN1; SMN2 (0.53) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL1218778 | 0.71 | GLA (0.36) | SMN1; SMN2NPSR1ALDH1A1 | |
| Carbamic Acid SCHEMBL27703082 | 0.69 | ALDH1A1 (0.47) | SMN1; SMN2NPSR1ALDH1A1TSHRHSD17B10 | |
| SCHEMBL3215937 | 0.69 | SMN1; SMN2 (0.50) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL22580151 | 0.68 | SMN1; SMN2 (0.49) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 | |
| SCHEMBL11637137 | 0.68 | ALDH1A1 (0.49) | SMN1; SMN2NPSR1ALDH1A1TSHREPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-8895229-B2 | Composition for formation of upper layer film, and method for formation of photoresist pattern | JSR CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8507189-B2 | Upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8501389-B2 | Upper layer-forming composition and resist patterning method | JSR CORPORATION (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110262859-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2011-10-27 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |