Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | KIF11 | P52732 | 2/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.43 |
| ▸ | AR | P10275 | 1/20 | 0.41 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | PTGES2 | Q9H7Z7 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | EEF2K | O00418 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3132687 | 1.00 | HSD11B1 (0.45) | HSD11B1ALDH1A1TSHRKIF11PTGS2 | |
| SCHEMBL3139775 | 1.00 | HSD11B1 (0.45) | HSD11B1ALDH1A1TSHRKIF11PTGS2 | |
| SCHEMBL3140036 | 0.94 | HSD11B1 (0.41) | HSD11B1ALDH1A1TSHRKIF11PTGS2 | |
| SCHEMBL3130388 | 0.94 | HSD11B1 (0.41) | HSD11B1ALDH1A1TSHRKIF11PTGS2 | |
| SCHEMBL3132851 | 0.92 | HSD11B1 (0.43) | HSD11B1ALDH1A1KIF11PTGS2AR | |
| SCHEMBL3134390 | 0.92 | TDP1 (0.47) | HSD11B1ALDH1A1KIF11PTGS2LMNA | |
| SCHEMBL3136577 | 0.92 | BCHE (0.49) | HSD11B1ALDH1A1KIF11PTGS2MEN1 | |
| SCHEMBL3143580 | 0.92 | BCHE (0.49) | HSD11B1ALDH1A1KIF11PTGS2MEN1 | |
| SCHEMBL3136049 | 0.92 | BCHE (0.49) | HSD11B1ALDH1A1KIF11PTGS2MEN1 | |
| SCHEMBL3134802 | 0.92 | HSD11B1 (0.47) | HSD11B1ALDH1A1TSHRKIF11PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2662727-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-08-14 | — | — | EP | disclosed |
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164127-A1 | PROCESS FOR PRODUCING ONIUM SALT DERIVATIVE AND NOVEL ONIUM SALT DERIVATIVE | Toyo Gosei Kogyo Co., Ltd. (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| US-5731364-A | PHOTORESIST | SHIPLEY COMPANY, L.L.C. (US) | 1998-03-24 | — | — | US | disclosed |