SCHEMBL3139775

SCHEMBL3139775

O=S(=O)(OS(c1ccccc1)(c1ccc(C(F)(F)F)cc1)c1ccc(C(F)(F)F)cc1)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.45
ALDH1A1 P00352 4/20 0.43
TSHR P16473 1/20 0.43
KIF11 P52732 2/20 0.43
PTGS2 P35354 1/20 0.43
AR P10275 1/20 0.41
TRPV6 Q9H1D0 1/20 0.41
MEN1 O00255 1/20 0.40
POLB P06746 1/20 0.40
KMT2A Q03164 1/20 0.40
KDM4E B2RXH2 1/20 0.40
PTGES2 Q9H7Z7 1/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40
HTT P42858 1/20 0.40
KEAP1 Q14145 1/20 0.40
NFE2L2 Q16236 1/20 0.40
EEF2K O00418 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL503702 1.00 HSD11B1 (0.45) HSD11B1ALDH1A1TSHRKIF11PTGS2
SCHEMBL3132687 1.00 HSD11B1 (0.45) HSD11B1ALDH1A1TSHRKIF11PTGS2
SCHEMBL3140036 0.94 HSD11B1 (0.41) HSD11B1ALDH1A1TSHRKIF11PTGS2
SCHEMBL3130388 0.94 HSD11B1 (0.41) HSD11B1ALDH1A1TSHRKIF11PTGS2
SCHEMBL3132851 0.92 HSD11B1 (0.43) HSD11B1ALDH1A1KIF11PTGS2AR
SCHEMBL3134390 0.92 TDP1 (0.47) HSD11B1ALDH1A1KIF11PTGS2LMNA
SCHEMBL3136577 0.92 BCHE (0.49) HSD11B1ALDH1A1KIF11PTGS2MEN1
SCHEMBL3143580 0.92 BCHE (0.49) HSD11B1ALDH1A1KIF11PTGS2MEN1
SCHEMBL3136049 0.92 BCHE (0.49) HSD11B1ALDH1A1KIF11PTGS2MEN1
SCHEMBL3134802 0.92 HSD11B1 (0.47) HSD11B1ALDH1A1TSHRKIF11PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2007-04-12 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070083060-A1 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid ARSA, HAO2, HAO1 HSD11B1 718/4885ALDH1A1 139/4885TSHR 1087/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.