SCHEMBL504243

SCHEMBL504243

Cc1ccc(S(=O)(=O)OC(CO)(C(=O)c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.45
ALDH1A1 P00352 5/20 0.42
TP53 P04637 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CES1 P23141 2/20 0.41
CES2 O00748 1/20 0.41
HSD11B1 P28845 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
STAT3 P40763 1/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
LMNA P02545 5/20 0.38
MAPT P10636 3/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
POLB P06746 1/20 0.37
ENPP2 Q13822 1/20 0.37
GAA P10253 1/20 0.36
NOD2 Q9HC29 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5913016 0.81 CES1 (0.45) RECQLALDH1A1TDP1CES1CES2
SCHEMBL6331638 0.80 RECQL (0.44) RECQLALDH1A1TP53TDP1CES1
SCHEMBL11917984 0.80 CES1 (0.43) RECQLALDH1A1TP53TDP1CES1
SCHEMBL11579454 0.79 CES1 (0.42) ALDH1A1TDP1CES1CES2HSD11B1
SCHEMBL6230138 0.79 RECQL (0.49) RECQLALDH1A1TP53TDP1CES1
SCHEMBL455255 0.78 CES1 (0.44) CES1CES2HSD11B1RAB9ALMNA
SCHEMBL10775915 0.77 RECQL (0.47) RECQLALDH1A1TP53TDP1CES1
SCHEMBL1625187 0.76 RECQL (0.38) RECQLALDH1A1TP53TDP1CES1
SCHEMBL547325 0.75 RECQL (0.46) RECQLALDH1A1TP53TDP1CES1
SCHEMBL452943 0.75 KMT2A (0.38) ALDH1A1CES1HSD11B1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 238 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5994022-A BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID JSR CORPORATION (JP) 1999-11-30 US claimed
JP-6027648-A None JP disclosed
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN disclosed
CN-119317999-A Method for processing component 日东电工株式会社 2025-01-14 CN disclosed
CN-119301209-A Transfer sheet 日东电工株式会社 2025-01-10 CN disclosed
CN-118946340-A Curable composition for dentistry having excellent color tone adaptability 可乐丽则武齿科株式会社 2024-11-12 CN disclosed
WO-2024075641-A1 POLYMER MATERIAL FOR USE IN DENTISTRY サンメディカル株式会社 2024-04-11 WO disclosed
WO-2023243636-A1 MEMBER PROCESSING METHOD 日東電工株式会社 2023-12-21 WO disclosed
WO-2023243634-A1 TRANSFER SHEET 日東電工株式会社 2023-12-21 WO disclosed
WO-2023191112-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY クラレノリタケデンタル株式会社 2023-10-05 WO disclosed
US-5891601-A DIPYRIDYL COMPOUND SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1999-04-06 US disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed
EP-0898201-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-02-24 EP disclosed
EP-0843220-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-05-20 EP disclosed
US-5744511-A BLEND OF COUMARIN DYES, ACID GENERATOR AND ARYL BORATE TOKUYAMA CORPORATION (JP) 1998-04-28 US disclosed
EP-0837367-A2 Positive resist composition comprising a dipyridyl compound SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1998-04-22 EP disclosed
EP-0837368-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1998-04-22 EP disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed
EP-0738928-A2 Visible-ray polymerization initiator and visible-ray polymerizable composition TOKUYAMA CORPORATION (JP) 1996-10-23 EP disclosed
JP-H0627648-A DAMPING WATERLESS ORIGINAL PLATE FOR PLANOGRAPHIC PRINTING TORAY IND INC 1994-02-04 JP disclosed