SCHEMBL452943

SCHEMBL452943

O=C(c1ccccc1)C(CO)(OS(=O)(=O)c1ccccc1C(F)(F)F)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
ALDH1A1 P00352 1/20 0.38
RAB9A P51151 1/20 0.38
HSD11B1 P28845 2/20 0.36
CES1 P23141 2/20 0.36
ALKBH2 Q6NS38 1/20 0.35
ALKBH3 Q96Q83 1/20 0.35
FTO Q9C0B1 1/20 0.35
POLB P06746 1/20 0.35
MMP7 P09237 1/20 0.35
KAT6A Q92794 1/20 0.34
MRGPRX4 Q96LA9 1/20 0.34
RXRA P19793 1/20 0.34
RXRB P28702 1/20 0.34
RXRG P48443 1/20 0.34
RORC P51449 1/20 0.34
PTGES O14684 1/20 0.33
SLC22A12 Q96S37 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL455255 0.82 CES1 (0.44) RAB9AHSD11B1CES1KAT6A
SCHEMBL5707358 0.78 PPARA (0.37) CES1
SCHEMBL11579454 0.77 CES1 (0.42) KMT2AMEN1ALDH1A1HSD11B1CES1
SCHEMBL5913016 0.76 CES1 (0.45) ALDH1A1RAB9ACES1KAT6A
SCHEMBL452944 0.75 HSD11B1 (0.40) KMT2AMEN1ALDH1A1RAB9AHSD11B1
SCHEMBL449214 0.75 CA1 (0.38) HSD11B1CES1KAT6ARORC
SCHEMBL504243 0.75 RECQL (0.45) KMT2AMEN1ALDH1A1RAB9AHSD11B1
SCHEMBL7945147 0.72 CES1 (0.49) KMT2AMEN1ALDH1A1CES1
SCHEMBL28241695 0.70 MEN1 (0.51) KMT2AMEN1ALDH1A1HSD11B1KAT6A
SCHEMBL36097 0.70 CES1 (0.59) KMT2ACES1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3010943-B1 CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM CANON KK (JP) 2024-04-03 EP disclosed
US-11332597-B2 Photo-curable composition and patterning method using the same CANON KABUSHIKI KAISHA (JP) 2022-05-17 US disclosed
EP-2841255-B1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS CANON KK (JP) 2020-05-13 EP disclosed
US-20200123343-A1 PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME CANON KK (JP) 2020-04-23 US disclosed
US-10472445-B2 Photocurable composition and method for manufacturing film CANON KABUSHIKI KAISHA (JP) 2019-11-12 US disclosed
US-10421853-B2 Photosensitive gas generating agent and photocurable composition CANON KABUSHIKI KAISHA (JP) 2019-09-24 US disclosed
EP-2907156-B1 IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING CANON KK (JP) 2019-04-10 EP disclosed
EP-2758987-B1 METHOD OF FORMING A FILM CANON KK (JP) 2019-03-20 EP disclosed
US-10233274-B2 Curable composition and patterning method using the same CANON KABUSHIKI KAISHA (JP) 2019-03-19 US disclosed
US-10208183-B2 Curable composition, film, and method of producing film CANON KABUSHIKI KAISHA (JP) 2019-02-19 US disclosed
US-20120061864-A1 METHOD FOR MANUFACTURING LENS, APPARATUS FOR MANUFACTURING LENS, AND METHOD FOR MANUFACTURING OPTICAL APPARATUS CANON KABUSHIKI KAISHA (JP) 2012-03-15 US disclosed
US-20110242672-A1 LENS AND METHOD FOR PRODUCING LENS CANON KABUSHIKI KAISHA (JP) 2011-10-06 US disclosed
EP-2372405-A1 Lens and method for producing lens Canon Kabushiki Kaisha (JP) 2011-10-05 EP disclosed
WO-2011027845-A1 MANUFACTURING METHOD FOR PLASTIC MEMBER AND PLASTIC MEMBER CANON KABUSHIKI KAISHA (JP) 2011-03-10 WO disclosed
US-20100273109-A1 METHOD FOR PRODUCING OPTICAL PART CANON KABUSHIKI KAISHA (JP) 2010-10-28 US disclosed
EP-2243622-A2 Method for producing optical part CANON KABUSHIKI KAISHA (JP) 2010-10-27 EP disclosed
EP-1011029-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-08-30 EP disclosed
US-6337171-B1 AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS JSR CORPORATION (JP) 2002-01-08 US disclosed
US-6280900-B1 RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE JSR CORPORATION (JP) 2001-08-28 US disclosed
EP-1011029-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2000-06-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10421853-B2 Photosensitive gas generating agent and photocurable composition PFN1, PFAS, FRG1 KMT2A 2544/4885MEN1 1716/4885ALDH1A1 4165/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.