Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 5/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | SRC | P12931 | 1/20 | 0.35 |
| ▸ | MLYCD | O95822 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL449214 | 0.86 | CA1 (0.38) | CES1PTPN1HSD11B1KAT6ACA1 | |
| SCHEMBL11579454 | 0.86 | CES1 (0.42) | CES1PTPN1HSD11B1SRCCES2 | |
| SCHEMBL5913016 | 0.85 | CES1 (0.45) | CES1PTPN1KAT6ASRCCES2 | |
| SCHEMBL452943 | 0.82 | KMT2A (0.38) | CES1HSD11B1KAT6ARAB9A | |
| SCHEMBL7945147 | 0.80 | CES1 (0.49) | CES1PTPN1SRCCES2LMNA | |
| SCHEMBL504243 | 0.78 | RECQL (0.45) | CES1HSD11B1CES2LMNARAB9A | |
| SCHEMBL36097 | 0.78 | CES1 (0.59) | CES1SRCCES2LMNAMAPK1 | |
| SCHEMBL1255415 | 0.76 | LMNA (0.50) | CES1SRCCES2LMNARAB9A | |
| SCHEMBL5574740 | 0.76 | CES1 (0.49) | CES1SRCCES2LMNAHIF1A | |
| SCHEMBL503875 | 0.76 | CES1 (0.42) | CES1PTPN1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230322998-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | BLUE CUBE IP LLC | 2023-10-12 | — | — | US | claimed |
| EP-4157905-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | Blue Cube IP LLC (US) | 2023-04-05 | — | — | EP | claimed |
| US-20100119835-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN INTERNATIONAL LLC (US) | 2010-05-13 | — | — | US | claimed |
| EP-2118197-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2009-11-18 | — | — | EP | claimed |
| WO-2008110512-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2008-09-18 | — | — | WO | claimed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| EP-4636039-A1 | PHOTOCURABLE COMPOSITION, AND PHOTOCURABLE COMPOSITION FOR 3D PRINTING AND USE THEREOF | Changzhou Tronly New Electronic Materials Co., Ltd (CN) | 2025-10-22 | — | — | EP | disclosed |
| US-20230364928-A1 | INKJET INK, METHOD FOR MANUFACTURING PRINTED MATERIAL, AND PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230322998-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | BLUE CUBE IP LLC | 2023-10-12 | — | — | US | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| EP-4157905-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | Blue Cube IP LLC (US) | 2023-04-05 | — | — | EP | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |