Ethylene Glycol

Ethylene Glycol

SCHEMBL5047766

C/C=C/Oc1ccccc1.OCCO

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.43
RECQL P46063 1/20 0.43
LTA4H P09960 4/20 0.36
CA4 P22748 1/20 0.36
LMNA P02545 1/20 0.35
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP4F2 P78329 1/20 0.33
CYP4A11 Q02928 1/20 0.33
KCNA3 P22001 1/20 0.33
ALOX15 P16050 1/20 0.33
PPARA Q07869 1/20 0.33
CA5A P35218 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
HTR1D P28221 1/20 0.31
HTR1B P28222 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5898125 0.89 CA4 (0.43) LTA4HCA4LMNATSHRKCNA3
SCHEMBL8347164 0.89 CA4 (0.43) LTA4HCA4LMNATSHRKCNA3
SCHEMBL6202477 0.89 CA4 (0.43) LTA4HCA4LMNATSHRKCNA3
Ammonia Solution, Strong SCHEMBL30411567 0.87 CA4 (0.42) LTA4HCA4LMNATSHRKCNA3
Sulfuric Acid SCHEMBL21110867 0.82 CA1 (0.38) ALDH1A1CA4LMNATSHRTDP1
Phosphoric Acid SCHEMBL21144483 0.82 SRC (0.47) CA4TSHRTDP1ALOX15CA5A
SCHEMBL5207997 0.81 LTA4H (0.52) LTA4HLMNATSHRNR1H2BAX
Sulfuric Acid SCHEMBL21111048 0.80 CA1 (0.36) ALDH1A1CA4LMNATSHRTDP1
Sebacic Acid SCHEMBL28010324 0.78 HDAC1 (0.47) ALDH1A1LMNATSHRPPARA
Ethylene Glycol SCHEMBL28494271 0.78 MTNR1A (0.44) ALDH1A1RECQLLMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118902885-A Preparation with antimicrobial property and preparation method and application thereof 广州遂初生物科技有限公司 2024-11-08 CN claimed
CN-114891763-B Streptomyces fei-derived cyclooxygenase, gene, vector, engineering bacteria, preparation method and application 安徽工程大学 2023-10-20 CN claimed
CN-116585223-A Silicon-free shampoo with good hair care effect 前研化妆品科技(上海)有限公司 2023-08-15 CN claimed
CN-110623949-A A composition containing azelaic acid monometal salt and Monoxazone for whitening and refining skin, and its preparation method 天津理工大学 2019-12-31 CN claimed
US-20130099423-A1 PHOTOCURABLE COMPOSITION FOR IMPRINT AND METHOD FOR FORMATION OF PATTERN USING THE COMPOSITION TOKUYAMA CORPORATION (JP) 2013-04-25 US claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
US-20260132301-A1 Ink Composition, Electronic Apparatus and Manufacturing Method of the Same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-14 US disclosed
CN-119735491-A Refining process of 3-phenoxypropane-1, 2-diol 陕西化工研究院有限公司 2025-04-01 CN disclosed
CN-119235708-A Inula flower extract, preparation method thereof and cosmetic composition 太和康美(北京)中医研究院有限公司 2025-01-03 CN disclosed
CN-118902885-A Preparation with antimicrobial property and preparation method and application thereof 广州遂初生物科技有限公司 2024-11-08 CN disclosed
CN-118902885-A Preparation with antimicrobial property and preparation method and application thereof 广州遂初生物科技有限公司 2024-11-08 CN disclosed
CN-114173757-B Composition containing glycyrrhetinic acid derivative 丸善制药株式会社 2024-10-29 CN disclosed
US-5363468-A Impregnating ultraviolet transmitting reinforcement with resin of epoxy (meth)acrylate, reactive (meth)acrylate diluent, xylene-formaldehyde resin and initiator; curing; tensile strength, moisture resistance KABUSHIKI KAISHA KOBE SEIKO SHO (JP) 1994-11-08 US disclosed
US-5332799-A Aromatic diamines, diesters of aromatic tetracarboxylic acids, circuit coatings BASF LACKE+FARBEN AKTIENGESELLSCHAFT (DE) 1994-07-26 US disclosed
US-5264545-A Aromatic or partly aromatic diamine with tetracarboxylic acid BASF LACKE+FARBEN AKTIENGESELLSCHAFT (DE) 1993-11-23 US disclosed
EP-0243605-B1 FLUORINE-CONTAINING RESIN COMPOSITION HAVING A LOW REFRACTIVE INDEX DAINIPPON INK AND CHEMICALS, INC. (JP) 1993-06-16 EP disclosed
EP-0430722-A2 Curable insulating material DAINIPPON INK AND CHEMICALS, INC. (JP) 1991-06-05 EP disclosed
US-4884866-A OPTICAL FIBERS DAINIPPON INK AND CHEMICALS, INC. (JP) 1989-12-05 US disclosed
US-4786658-A ACRYLIC ESTER POLYMER, CLADDING FOR OPTICAL FIBERS DAINIPPON INK AND CHEMICALS, INC. (JP) 1988-11-22 US disclosed
EP-0243605-A2 Fluorine-containing resin composition having a low refractive index DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-11-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260132301-A1 Ink Composition, Electronic Apparatus and Manufacturing Method of the Same EED, MMAB, MARK1 ALDH1A1 1300/4885RECQL 539/4885LTA4H 2285/4885
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 ALDH1A1 209/4885RECQL 860/4885LTA4H 790/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.