SCHEMBL5075286

SCHEMBL5075286

C=C(C)C(=O)OC.C=C(C=C(C)C(=O)O)C(=O)OCC.C=C(C=Cc1ccccc1)C(=O)OCCCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.44
TDP1 Q9NUW8 1/20 0.42
RAB9A P51151 3/20 0.40
ALDH1A1 P00352 2/20 0.38
LMNA P02545 2/20 0.38
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA9 Q16790 1/20 0.37
EGFR P00533 1/20 0.37
HDAC3 O15379 1/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
POLB P06746 2/20 0.37
MAPT P10636 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
BCHE P06276 2/20 0.36
NPC1 O15118 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
TSHR P16473 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL464928 0.90 TDP1 (0.50) KDM4ETDP1RAB9AEGFRHDAC3
SCHEMBL10940584 0.88 TDP1 (0.47) KDM4ETDP1RAB9ALMNAEGFR
Styrene SCHEMBL461109 0.87 KDM4E (0.43) KDM4ETDP1RAB9AALDH1A1LMNA
Acrylic Acid Ethyl Ester SCHEMBL11604011 0.86 TDP1 (0.43) KDM4ETDP1RAB9ALMNACA12
Methacrylic Acid SCHEMBL600293 0.85 RAB9A (0.49) KDM4ETDP1RAB9AALDH1A1LMNA
SCHEMBL1087500 0.85 RAB9A (0.51) KDM4ETDP1RAB9AALDH1A1LMNA
SCHEMBL195505 0.85 KDM4E (0.42) KDM4ETDP1RAB9AALDH1A1LMNA
Methacrylic Acid SCHEMBL15376306 0.85 KDM4E (0.44) KDM4ETDP1RAB9AALDH1A1EGFR
Methacrylic Acid SCHEMBL390016 0.84 KDM4E (0.49) KDM4ETDP1RAB9AALDH1A1EGFR
Acrylic Acid Methyl Ester SCHEMBL740218 0.84 TDP1 (0.45) KDM4ETDP1RAB9AEGFRHDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1058697-B1 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR DU PONT (US) 2008-11-26 EP disclosed
US-6548602-B2 Photosensitive film blend including comb polymer capable of hydrogen bonding, also containing an unsaturated monomer and photoinitiator system; use as photoresists or solder masks in printed circuit E. I. DU PONT DE NEMOURS AND COMPANY 2003-04-15 US disclosed
EP-1058697-A4 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR DU PONT (US) 2002-10-16 EP disclosed
US-20010051689-A1 Polymeric films having controlled viscosity response to temperature and shear FOREMAN THOMAS KEVIN (US) 2001-12-13 US disclosed
EP-1058697-A1 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-12-13 EP disclosed
WO-1999045045-A1 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-09-10 WO disclosed