SCHEMBL5081332

SCHEMBL5081332

C=C(CO)C(=O)Oc1ccc(OC)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.46
CES2 O00748 1/20 0.44
CES1 P23141 1/20 0.44
LMNA P02545 2/20 0.44
GAA P10253 2/20 0.44
CA1 P00915 5/20 0.42
CA2 P00918 5/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
GSK3B P49841 1/20 0.42
HDAC3 O15379 1/20 0.42
HDAC4 P56524 1/20 0.42
HDAC1 Q13547 1/20 0.42
HDAC7 Q8WUI4 1/20 0.42
HDAC2 Q92769 1/20 0.42
HDAC10 Q969S8 1/20 0.42
HDAC11 Q96DB2 1/20 0.42
HDAC8 Q9BY41 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5078367 0.85 LMNA (0.52) MAPTLMNAGAACYP1A2CYP2C9
SCHEMBL27497707 0.85 KMT2A (0.46) MAPTCES2CES1LMNAGAA
SCHEMBL22561082 0.82 BACE1 (0.48) MAPTSMN1; SMN2CYP1A2CYP2C9CYP2C19
SCHEMBL824141 0.81 ELANE (0.46) MAPTALDH1A1
SCHEMBL5081953 0.81 MAPT (0.49) MAPTLMNASMN1; SMN2HTTALDH1A1
SCHEMBL27731554 0.80 KDM4E (0.44) MAPTSMN1; SMN2HDAC3HDAC1HDAC2
SCHEMBL7061292 0.80 CES2 (0.58) CES2CES1LMNAGAACA1
SCHEMBL10204698 0.79 ELANE (0.45) MAPTLMNAGAASMN1; SMN2CYP1A2
SCHEMBL450454 0.79 ELANE (0.61) MAPTCES2CES1LMNAGAA
SCHEMBL10204713 0.78 MAPT (0.65) MAPTCES2CES1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
EP-1752475-B1 Lactone ring-containing polymer having few foreign matters and not easily causing gelation, and its applications NIPPON CATALYTIC CHEM IND (JP) 2008-11-05 EP disclosed
US-20070037962-A1 Lactone ring-containing polymer having few foreign matters and not easily causing gelation, and its applications NIPPON SHOKUBAI CO., LTD. (JP) 2007-02-15 US disclosed
EP-1752475-A1 Lactone ring-containing polymer having few foreign matters and not easily causing gelation, and its applications NIPPON SHOKUBAI CO., LTD. (JP) 2007-02-14 EP disclosed