SCHEMBL5084656

SCHEMBL5084656

CNc1cc(NC)c(NC(=O)OC)cc1NC(=O)OC

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.59
ALOX15 P16050 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.42
HTT P42858 2/20 0.41
PKM P14618 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
MAPT P10636 2/20 0.40
KDM4E B2RXH2 1/20 0.39
POLB P06746 1/20 0.39
ATM Q13315 1/20 0.39
PLAU P00749 1/20 0.38
ALDH1A1 P00352 2/20 0.38
FAAH O00519 1/20 0.38
CYP3A4 P08684 1/20 0.38
MAPK1 P28482 1/20 0.38
LMNA P02545 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5084623 1.00 HPGD (0.59) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL5085327 0.91 HPGD (0.68) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL11658876 0.79 HPGD (0.67) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL5082238 0.76 POLB (0.47) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL5084570 0.76 POLB (0.47) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL10099723 0.76 HPGD (0.52) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL11657425 0.74 HPGD (0.55) HPGDALOX15SMN1; SMN2HTTPKM
SCHEMBL11661335 0.74 HPGD (0.60) HPGDALOX15SMN1; SMN2HTTMEN1
SCHEMBL7250153 0.74 HPGD (0.42) HPGDSMN1; SMN2HTTPKMKMT2A
SCHEMBL7251834 0.74 PKM (0.47) HPGDSMN1; SMN2HTTPKMMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1462471-B1 Dielectric films and materials therefor DAICEL CHEM (JP) 2008-07-30 EP disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-20070078256-A1 Prepolymers, prepolymer compositions, high-molecular-weight polymers with pore structure, and dielectric films DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-05 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
US-7186454-B2 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-03-06 US disclosed
EP-1683822-A1 PREPOLYMER, PREPOLYMER COMPOSITION, HIGH MOLECULAR WEIGHT POLYMER HAVING STRUCTURE CONTAINING HOLE AND ELECTRICALLY INSULATING FILM Daicel Chemical Industries, Ltd. (JP) 2006-07-26 EP disclosed
EP-1462471-A1 Dielectric films and materials thereof Daicel Chemical Industries, Ltd. (JP) 2004-09-29 EP disclosed
US-20040175858-A1 Dielectric films and materials therefor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-09 US disclosed