Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.37 |
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.36 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 6/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.36 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.36 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.36 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30596201 | 0.97 | HIF1A (0.45) | HIF1ATDP1LMNATSHRALOX12 | |
| SCHEMBL9752186 | 0.93 | HIF1A (0.43) | HIF1ATDP1LMNATSHRALOX12 | |
| Fluoride Ion SCHEMBL1961963 | 0.93 | HIF1A (0.43) | HIF1ATDP1LMNATSHRALOX12 | |
| Bromide SCHEMBL2355315 | 0.93 | HIF1A (0.43) | HIF1ATDP1LMNATSHRALOX12 | |
| Iodide SCHEMBL5087524 | 0.93 | HIF1A (0.43) | HIF1ATDP1LMNATSHRALOX12 | |
| Water SCHEMBL1067231 | 0.93 | HIF1A (0.43) | HIF1ATDP1LMNATSHRALOX12 | |
| SCHEMBL7877206 | 0.90 | HIF1A (0.41) | HIF1ATDP1LMNATSHRALOX12 | |
| Phenol SCHEMBL7874538 | 0.83 | HIF1A (0.36) | HIF1ATDP1LMNATSHRALOX12 | |
| SCHEMBL7872878 | 0.83 | HIF1A (0.42) | HIF1ALMNATSHRTAAR1SLC6A2 | |
| Sulfuric Acid SCHEMBL7643758 | 0.81 | CA12 (0.36) | HIF1ATDP1LMNATSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118616088-A | Catalyst for co-production of piperazine from ethylenediamine by ethanolamine, and preparation method and application thereof | 中国科学院大连化学物理研究所 | 2024-09-10 | — | — | CN | claimed |
| US-6316575-B1 | MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2001-11-13 | — | — | US | claimed |
| CN-118616088-A | Catalyst for co-production of piperazine from ethylenediamine by ethanolamine, and preparation method and application thereof | 中国科学院大连化学物理研究所 | 2024-09-10 | — | — | CN | disclosed |
| CN-113248688-A | Epoxy-terminated polyesters | 罗门哈斯公司 | 2021-08-13 | — | — | CN | disclosed |
| EP-2683792-B1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-09-25 | — | — | EP | disclosed |
| US-9200372-B2 | Passivation composition and process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-12-01 | — | — | US | disclosed |
| US-8889025-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140120734-A1 | Novel Etching Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-05-01 | — | — | US | disclosed |
| US-8647523-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-02-11 | — | — | US | disclosed |
| EP-2683792-A1 | NOVEL ETCHING COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2014-01-15 | — | — | EP | disclosed |
| US-20130122701-A1 | Novel Passivation Composition and Process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2013-05-16 | — | — | US | disclosed |
| US-4393253-A | Hydroxylation of olefins | EXXON RESEARCH & ENGINEERING CO. (US) | 1983-07-12 | — | — | US | disclosed |
| US-4390739-A | Hydroxylation of olefins | EXXON RESEARCH & ENGINEERING CO. (US) | 1983-06-28 | — | — | US | disclosed |
| EP-0077202-A2 | Process for hydroxylating olefins using osmium-halogen compound catalysts | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1983-04-20 | — | — | EP | disclosed |
| EP-0077201-A2 | Hydroxylation of olefins | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1983-04-20 | — | — | EP | disclosed |
| EP-0053023-A1 | Hydroxylation of olefins | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1982-06-02 | — | — | EP | disclosed |
| US-4251469-A | ADDITIVES FOR EXTREME PRESSURE LUBRICANTS | CIBA-GEIGY CORPORATION (US) | 1981-02-17 | — | — | US | disclosed |
| US-4197209-A | Lubricant compositions containing sulfur-containing esters of phosphoric acid | CIBA-GEIGY CORPORATION (US) | 1980-04-08 | — | — | US | disclosed |
| US-4189453-A | FROM MERCAPTANS AND PHOSPHORUS TRIHALIDE, CATALYTIC | CIBA-GEIGY CORPORATION (US) | 1980-02-19 | — | — | US | disclosed |
| US-3992370-A | 1,1-Dichloro-1a,1b-dihydrodibenzo(b,f)cycloprop(d)azepine-6(1H)-carboxaldehyde | TAKEDA CHEMICAL INDUSTRIES, LTD. (JA) | 1976-11-16 | — | — | US | disclosed |