SCHEMBL5116946

SCHEMBL5116946

C=C1OC(c2ccccc2)OC1=O

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.47
MEN1 O00255 1/20 0.47
POLB P06746 1/20 0.47
KMT2A Q03164 1/20 0.47
SIRT1 Q96EB6 17/20 0.46
SIRT2 Q8IXJ6 2/20 0.41
SIRT5 Q9NXA8 2/20 0.41
TP53 P04637 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
MAPT P10636 1/20 0.40
MAPK1 P28482 1/20 0.40
HTR2B P41595 1/20 0.40
ALDH1A1 P00352 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14447066 0.74 MEN1 (0.47) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL10397442 0.73 MEN1 (0.60) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL5432121 0.72 MEN1 (0.41) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL120709 0.71 MEN1 (0.48) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL7379470 0.71 MEN1 (0.48) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL11883260 0.71 CYP19A1 (0.53) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL30362056 0.71 CYP19A1 (0.53) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL5182809 0.70 LMNA (0.47) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL4740403 0.70 POLB (0.47) LMNAMEN1POLBKMT2ASIRT1
SCHEMBL8207399 0.70 MEN1 (0.47) LMNAMEN1POLBKMT2ASIRT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20070155926-A1 Degradable polymers MATYJASZEWSKI KRZYSZTOF 2007-07-05 US disclosed
US-20070155926-A1 Degradable polymers MATYJASZEWSKI KRZYSZTOF 2007-07-05 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
WO-2004087777-A2 DEGRADABLE POLYMERS CARNEGIE MELLON UNIVERSITY (US) 2004-10-14 WO disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed
US-5115058-A Bio- and photo-degradable resin composition THE DOW CHEMICAL COMPANY (US) 1992-05-19 US disclosed