SCHEMBL5117019

SCHEMBL5117019

C=C1OC(C)(C2CC3CCC2C3)OC1=O

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5117684 0.78 HSD11B1 (0.30) HSD11B1
SCHEMBL5117003 0.76 HSD11B1 (0.33) HSD11B1
SCHEMBL5118672 0.62 HSD11B1 (0.32) HSD11B1
SCHEMBL5123876 0.61 HSD11B1 (0.31) HSD11B1
SCHEMBL5124668 0.60 HSD11B1 (0.32) HSD11B1
SCHEMBL5124539 0.59 HSD11B1 (0.38) HSD11B1
SCHEMBL15974979 0.58 HSD11B1 (0.34) HSD11B1
SCHEMBL5117712 0.58
SCHEMBL5117663 0.57 HSD11B1 (0.33) HSD11B1
SCHEMBL18639034 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed