SCHEMBL5124668

SCHEMBL5124668

C=C1OC(C)(C23CC4CC(CC(C4)C2)C3)OC1=O

nearest known ligand 0.32

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.32
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
PTGS2 P35354 1/20 0.30
STAT3 P40763 1/20 0.30
NLRP3 Q96P20 1/20 0.30
CTSD P07339 1/20 0.30
BACE1 P56817 1/20 0.30
BACE2 Q9Y5Z0 1/20 0.30
PRMT5 O14744 1/20 0.30
WDR77 Q9BQA1 1/20 0.30
CYP3A4 P08684 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5110098 0.76 HSD11B1 (0.37) HSD11B1CTSDBACE1BACE2PRMT5
SCHEMBL5117895 0.73 SLC22A2 (0.35) HSD11B1
SCHEMBL5117663 0.71 HSD11B1 (0.33) HSD11B1
SCHEMBL5117899 0.70 EPHX2 (0.36)
SCHEMBL5117640 0.68 HSD11B1 (0.32) HSD11B1
SCHEMBL5110358 0.67 HSD11B1 (0.38) HSD11B1
SCHEMBL5116892 0.67 HSD11B1 (0.31) HSD11B1
SCHEMBL5117003 0.67 HSD11B1 (0.33) HSD11B1
SCHEMBL5117595 0.66 MEN1 (0.35) HSD11B1
SCHEMBL5118096 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed