SCHEMBL5117663

SCHEMBL5117663

C=C1OC(C)(CC23CC4CC(CC(C4)C2)C3)OC1=O

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 3/20 0.33
HSD17B10 Q99714 1/20 0.33
EPHX2 P34913 3/20 0.31
ALDH1A1 P00352 1/20 0.31
GRIN2D O15399 1/20 0.31
GRIN3B O60391 1/20 0.31
GRIN1 Q05586 1/20 0.31
GRIN2A Q12879 1/20 0.31
GRIN2B Q13224 1/20 0.31
GRIN2C Q14957 1/20 0.31
GRIN3A Q8TCU5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5117899 0.86 EPHX2 (0.36) HSD17B10EPHX2ALDH1A1GRIN2DGRIN3B
SCHEMBL5110358 0.79 HSD11B1 (0.38) HSD11B1HSD17B10EPHX2ALDH1A1GRIN2D
SCHEMBL5118672 0.73 HSD11B1 (0.32) HSD11B1
SCHEMBL5117595 0.72 MEN1 (0.35) HSD11B1HSD17B10EPHX2ALDH1A1GRIN2D
SCHEMBL5124668 0.71 HSD11B1 (0.32) HSD11B1
SCHEMBL5123876 0.71 HSD11B1 (0.31) HSD11B1
SCHEMBL5110098 0.69 HSD11B1 (0.37) HSD11B1ALDH1A1
SCHEMBL5117895 0.67 SLC22A2 (0.35) HSD11B1EPHX2ALDH1A1
SCHEMBL5117591 0.64 HSD11B1 (0.33) HSD11B1EPHX2
SCHEMBL5117003 0.63 HSD11B1 (0.33) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1447403-B1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS MITSUBISHI RAYON CO (JP) 2016-02-03 EP disclosed
US-7316884-B2 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI RAYON CO., LTD. (JP) 2008-01-08 US disclosed
US-20040248031-A1 5-Methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-09 US disclosed
EP-1447403-A1 5-METHYLENE-1,3-DIOXOLAN-4-ONE DERIVATIVES, PROCESS FOR THEIR PRODUCTION, POLYMERS OF THE DERIVATIVES, RESIST COMPOSITIONS, AND PATTERN FORMATION PROCESS Mitsubishi Rayon Co., Ltd. (JP) 2004-08-18 EP disclosed