⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL514808 | 0.85 | PKM (0.38) | — | |
| SCHEMBL18758104 | 0.81 | — | — | |
| SCHEMBL14149400 | 0.78 | DPP4 (0.31) | — | |
| SCHEMBL14608477 | 0.76 | — | — | |
| SCHEMBL3847068 | 0.76 | NPSR1 (0.36) | — | |
| SCHEMBL14410607 | 0.74 | — | — | |
| SCHEMBL10305868 | 0.73 | — | — | |
| SCHEMBL13870716 | 0.72 | PKM (0.36) | — | |
| SCHEMBL15450122 | 0.72 | — | — | |
| SCHEMBL15450120 | 0.72 | DPP4 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1766474-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2007-03-28 | — | — | EP | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| CN-114207043-A | Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same | 默克专利有限公司 | 2022-03-18 | — | — | CN | disclosed |
| EP-1815296-B1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2020-02-19 | — | — | EP | disclosed |
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| US-20190180888-A1 | CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-13 | — | — | US | disclosed |
| EP-2598589-B1 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2019-05-22 | — | — | EP | disclosed |
| EP-1877864-B1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | MERCK PATENT GMBH (DE) | 2018-09-19 | — | — | EP | disclosed |
| CN-103025835-B | The compositions of coating on photoetching agent pattern | 默克专利有限公司 | 2016-06-29 | — | — | CN | disclosed |
| US-8852848-B2 | Composition for coating over a photoresist pattern | Z Electronic Materials USA Corp. (US) | 2014-10-07 | — | — | US | disclosed |
| WO-2004101490-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-11-25 | — | — | WO | disclosed |
| US-20040229155-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2004-11-18 | — | — | US | disclosed |
| WO-2004077153-A2 | PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-10 | — | — | WO | disclosed |
| US-20040175653-A1 | Photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-09 | — | — | US | disclosed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | disclosed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | disclosed |
| EP-1311908-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2003-05-21 | — | — | EP | disclosed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | disclosed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | disclosed |