Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | DPP4 | P27487 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL513305 | 0.85 | — | — | |
| SCHEMBL13957641 | 0.84 | ALDH1A1 (0.36) | PKMALDH1A1DPP4HSD11B1L3MBTL1 | |
| SCHEMBL13870716 | 0.84 | PKM (0.36) | PKMALDH1A1DPP4HSD11B1 | |
| SCHEMBL3847068 | 0.82 | NPSR1 (0.36) | ALDH1A1 | |
| SCHEMBL5917754 | 0.79 | PKM (0.42) | PKMALDH1A1DPP4HSD11B1 | |
| SCHEMBL22991690 | 0.77 | PKM (0.41) | PKMALDH1A1DPP4HSD11B1 | |
| SCHEMBL17036824 | 0.77 | PKM (0.41) | PKMALDH1A1HSD11B1 | |
| SCHEMBL2758375 | 0.77 | PKM (0.41) | PKMALDH1A1DPP4HSD11B1 | |
| SCHEMBL18758104 | 0.76 | — | — | |
| SCHEMBL13998863 | 0.75 | PKM (0.42) | PKMALDH1A1DPP4HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115160495-A | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-109294314-B | Epoxy acrylic acid cathodic electrophoretic coating resin emulsion and preparation method thereof | 中国海洋石油集团有限公司 | 2020-10-16 | — | — | CN | claimed |
| EP-1766474-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2007-03-28 | — | — | EP | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| CN-122071553-A | Preparation method of negative development photoresist resin | 万华化学集团股份有限公司 | 2026-05-22 | — | — | CN | disclosed |
| CN-119060530-B | Preparation process of composite ceramic material | 淮北师范大学 | 2025-01-28 | — | — | CN | disclosed |
| CN-119242126-A | Preparation process of halogen-free flame-retardant solid powder coating | 泉州蝶彩新材料有限责任公司 | 2025-01-03 | — | — | CN | disclosed |
| CN-119060530-A | Preparation process of composite ceramic material | 淮北师范大学 | 2024-12-03 | — | — | CN | disclosed |
| CN-115160495-A | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2022-10-11 | — | — | CN | disclosed |
| CN-114207043-A | Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same | 默克专利有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-109294314-B | Epoxy acrylic acid cathodic electrophoretic coating resin emulsion and preparation method thereof | 中国海洋石油集团有限公司 | 2020-10-16 | — | — | CN | disclosed |
| US-20040229155-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2004-11-18 | — | — | US | disclosed |
| WO-2004077153-A2 | PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-10 | — | — | WO | disclosed |
| US-20040175653-A1 | Photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-09 | — | — | US | disclosed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | disclosed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | disclosed |
| EP-1311908-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2003-05-21 | — | — | EP | disclosed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | disclosed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | SUN2, UROD, ERCC1 | PKM 3037/4885ALDH1A1 2510/4885DPP4 3000/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.