SCHEMBL3847068

SCHEMBL3847068

C=C(C)COC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.36
ALDH1A1 P00352 2/20 0.35
MEN1 O00255 1/20 0.35
HTT P42858 1/20 0.35
KMT2A Q03164 1/20 0.35
TSHR P16473 2/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL514808 0.82 PKM (0.38) ALDH1A1
SCHEMBL3849672 0.76
SCHEMBL513305 0.76
SCHEMBL6902701 0.75 ALDH1A1 (0.35) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL1072125 0.72 ALDH1A1 (0.39) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL1219034 0.72 LMNA (0.41) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL27437168 0.72 MAPT (0.39) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL27993991 0.71 NPSR1 (0.40) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL16553934 0.71 MEN1 (0.46) NPSR1ALDH1A1MEN1HTTKMT2A
SCHEMBL2735076 0.71 ALDH1A1 (0.41) NPSR1ALDH1A1MEN1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2102184-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP disclosed
EP-2102156-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP disclosed
EP-1963919-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2008-09-03 EP disclosed
WO-2008068617-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO disclosed
WO-2008068610-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO disclosed
WO-2007057773-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-05-24 WO disclosed
EP-1709485-A2 PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF AZ Electronic Materials USA Corp. (US) 2006-10-11 EP disclosed
WO-2006013475-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2006-02-09 WO disclosed
WO-2005059652-A2 PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2005-06-30 WO disclosed
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP disclosed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO disclosed