SCHEMBL5133677

SCHEMBL5133677

C=Cc1ccc(/C=N/c2cc(Cl)ccc2O)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.49
MEN1 O00255 5/20 0.49
KMT2A Q03164 5/20 0.49
GAA P10253 2/20 0.49
TDP1 Q9NUW8 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
ALDH1A1 P00352 6/20 0.47
HTT P42858 3/20 0.47
JAK2 O60674 1/20 0.47
MAOA P21397 3/20 0.43
MAOB P27338 3/20 0.43
L3MBTL1 Q9Y468 3/20 0.41
CASP3 P42574 1/20 0.41
SENP7 Q9BQF6 1/20 0.41
SENP6 Q9GZR1 1/20 0.41
CDK2 P24941 1/20 0.40
LMNA P02545 4/20 0.39
MAPT P10636 4/20 0.39
HPGD P15428 3/20 0.39
POLB P06746 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5133679 1.00 KDM4E (0.49) KDM4EMEN1KMT2AGAATDP1
SCHEMBL113553 0.83 ALDH1A1 (0.56) KDM4EMEN1KMT2AGAATDP1
SCHEMBL113555 0.83 ALDH1A1 (0.56) KDM4EMEN1KMT2AGAATDP1
SCHEMBL29380895 0.83 ALDH1A1 (0.56) KDM4EMEN1KMT2AGAATDP1
SCHEMBL14030969 0.82 KDM4E (0.45) KDM4EMEN1KMT2AGAATDP1
SCHEMBL5132992 0.81 KDM4E (0.47) KDM4EMEN1KMT2AGAATDP1
SCHEMBL5132994 0.81 KDM4E (0.47) KDM4EMEN1KMT2AGAATDP1
SCHEMBL7976667 0.77 ALDH1A1 (0.51) KDM4EMEN1KMT2AGAATDP1
SCHEMBL7976665 0.77 ALDH1A1 (0.51) KDM4EMEN1KMT2AGAATDP1
SCHEMBL5131925 0.76 MEN1 (0.49) KDM4EMEN1KMT2AGAASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed