SCHEMBL7976667

SCHEMBL7976667

CCN(CC)c1ccc(C=Nc2cc(Cl)ccc2O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 15/20 0.51
KDM4E B2RXH2 8/20 0.51
GAA P10253 8/20 0.51
MAPT P10636 12/20 0.46
KMT2A Q03164 7/20 0.46
MEN1 O00255 6/20 0.46
TDP1 Q9NUW8 3/20 0.46
LMNA P02545 2/20 0.46
CRHBP P24387 1/20 0.46
CRHR2 Q13324 1/20 0.46
THRB P10828 2/20 0.45
MAPK1 P28482 1/20 0.45
RAB9A P51151 4/20 0.44
NPC1 O15118 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
CASP1 P29466 2/20 0.43
CASP7 P55210 1/20 0.43
HBB P68871 1/20 0.43
HPGD P15428 2/20 0.43
GLA P06280 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7976665 1.00 ALDH1A1 (0.51) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7974520 0.80 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7974522 0.80 ALDH1A1 (0.57) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962873 0.78 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL7962875 0.78 ALDH1A1 (0.54) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL14031063 0.77 GAA (0.42) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL14031061 0.77 KDM4E (0.42) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL5132992 0.77 KDM4E (0.47) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL5132994 0.77 KDM4E (0.47) ALDH1A1KDM4EGAAMAPTKMT2A
SCHEMBL5133679 0.77 KDM4E (0.49) ALDH1A1KDM4EGAAMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268108-B1 MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT TOKYO OHKA KOGYO CO., LTD. (JP) 2001-07-31 US disclosed
US-6071673-A Method for the formation of resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2000-06-06 US disclosed