Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | TXNRD1 | Q16881 | 3/20 | 0.44 |
| ▸ | GSR | P00390 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.44 |
| ▸ | MEN1 | O00255 | 4/20 | 0.43 |
| ▸ | NPC1 | O15118 | 3/20 | 0.43 |
| ▸ | RAB9A | P51151 | 3/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | AR | P10275 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27589225 | 0.88 | KMT2A (0.46) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL5136209 | 0.85 | HTT (0.49) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL28290110 | 0.81 | TDP1 (0.46) | HTTALDH1A1CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL952171 | 0.80 | KMT2A (0.49) | HTTALDH1A1MAPK1KMT2AMEN1 | |
| SCHEMBL13098341 | 0.80 | TDP1 (0.41) | ALDH1A1KMT2AMEN1NPC1RAB9A | |
| SCHEMBL28296024 | 0.78 | ALDH1A1 (0.59) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL27546323 | 0.78 | HTT (0.59) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL5711756 | 0.78 | TDP1 (0.46) | HTTALDH1A1CYP2C9CYP2C19CYP1A2 | |
| SCHEMBL29052299 | 0.77 | HTT (0.42) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL8970631 | 0.77 | HTT (0.66) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12326662-B2 | Method for manufacturing microstructure including cured products of photosensitive resin compositions | CANON KABUSHIKI KAISHA (JP) | 2025-06-10 | — | — | US | disclosed |
| US-20230144597-A1 | METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD | CANON KABUSHIKI KAISHA (JP) | 2023-05-11 | — | — | US | disclosed |
| CN-105849636-B | Underlayer composition for promoting self-assembly and methods of making and using | AZ电子材料卢森堡有限公司 | 2019-09-27 | — | — | CN | disclosed |
| CN-105492972-B | Stable metal compounds as hard masks and fill materials, compositions thereof, and methods of use | AZ电子材料卢森堡有限公司 | 2019-09-06 | — | — | CN | disclosed |
| CN-105900014-B | Polyoxometallate and heteropolyoxometalate compositions and methods of use thereof | AZ电子材料卢森堡有限公司 | 2019-09-03 | — | — | CN | disclosed |
| CN-110100206-A | Rotary coating material compositions comprising metal oxide nanoparticles and organic polymer | 睿智弗尤德收购公司 | 2019-08-06 | — | — | CN | disclosed |
| CN-109988478-A | The method of photoresist topcoating composition and processing photo-corrosion-resisting agent composition | 罗门哈斯电子材料有限责任公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-109991807-A | Photoresist topcoat compositions and methods of treating photoresist compositions | 罗门哈斯电子材料有限责任公司 | 2019-07-09 | — | — | CN | disclosed |
| CN-107251203-B | Metal hard mask composition and method for forming fine pattern on a semiconductor substrate | AZ电子材料卢森堡有限公司 | 2019-05-17 | — | — | CN | disclosed |
| CN-109180722-A | Stable metallic compound, their compositions and their application method | AZ电子材料卢森堡有限公司 | 2019-01-11 | — | — | CN | disclosed |
| CN-1804670-A | Optical dry-films and methods of forming optical devices with dry films | ROHM & HAAS ELECT MAT (US) | 2006-07-19 | — | — | CN | disclosed |
| CN-1804671-A | Optical dry-films and methods of forming optical devices with dry films | ROHM & HAAS ELECT MAT (US) | 2006-07-19 | — | — | CN | disclosed |
| CN-1773313-A | Waveguide compositions and waveguides formed therefrom | ROHM & HAAS ELECT MAT (US) | 2006-05-17 | — | — | CN | disclosed |
| CN-1215381-C | Antireflective composition for deep ultraviolet photoresist | AZ ELECTRONIC MATERIAL CO LTD (JP) | 2005-08-17 | — | — | CN | disclosed |
| CN-1598696-A | Method of forming optical element | ROHM & HAAS ELECT MAT (US) | 2005-03-23 | — | — | CN | disclosed |
| US-20040220348-A1 | Polymers obtained from monomers allowing a sequential polymerization, and their use for preparing ionic conductors | MICHOT CHRISTOPHE (FR) | 2004-11-04 | — | — | US | disclosed |
| US-20030125437-A1 | Polymers obtained from monomers allowing a sequential polymerization, and their use for preparing ionic conductors | MICHOT CHRISTOPHE (FR) | 2003-07-03 | — | — | US | disclosed |
| US-6492449-B2 | POLYMERS OBTAINED BY ANIONIC INITIATION AND BEARING FUNCTIONS THAT CAN BE ACTIVATED BY CATIONIC INITIATIONS THAT ARE NOT REACTIVE IN THE PRESENCE OF ANIONIC POLYMERIZATION INITIATORS. | HYDRO-QUEBEC (CA) | 2002-12-10 | — | — | US | disclosed |
| US-20020128364-A1 | POLYMERS OBTAINED FROM MONOMERS ALLOWING A SEQUENTIAL POLYMERIZATION, AND THEIR USE FOR PREPARING IONIC CONDUCTORS | HYDRO-QUEBEC (CA) | 2002-09-12 | — | — | US | disclosed |
| CN-1330779-A | Antireflective composition for deep ultraviolet photoresist | CLARIANT INT LTD (CH) | 2002-01-09 | — | — | CN | disclosed |