Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.49 |
| ▸ | RAB9A | P51151 | 4/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.41 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | KIF18A | Q8NI77 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.39 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | GFER | P55789 | 1/20 | 0.39 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7602645 | 0.89 | PRMT5 (0.43) | KMT2AMEN1ALDH1A1PRMT5WDR77 | |
| SCHEMBL59130 | 0.88 | ALDH1A1 (0.47) | KMT2ARAB9AMEN1MAPTALDH1A1 | |
| SCHEMBL7604077 | 0.85 | SMN1; SMN2 (0.47) | KMT2ARAB9AMEN1MAPTPKM | |
| SCHEMBL244116 | 0.84 | ALDH1A1 (0.49) | KMT2ARAB9AMEN1ALDH1A1HTT | |
| SCHEMBL3253710 | 0.84 | PTGS2 (0.42) | KMT2ARAB9AMEN1MAPTNPC1 | |
| SCHEMBL9550122 | 0.82 | ALDH1A1 (0.46) | KMT2AMAPTALDH1A1PKMTDP1 | |
| SCHEMBL9550116 | 0.81 | ALDH1A1 (0.44) | KMT2ARAB9AMEN1MAPTALDH1A1 | |
| SCHEMBL9550105 | 0.81 | ALDH1A1 (0.44) | KMT2AMAPTALDH1A1PKMTDP1 | |
| SCHEMBL5135093 | 0.81 | HSD17B10 (0.49) | KMT2AMEN1ALDH1A1PKMTDP1 | |
| SCHEMBL5135097 | 0.80 | HTT (0.49) | KMT2ARAB9AMEN1MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313892-B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2012-11-20 | — | — | US | claimed |
| EP-1612603-A2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2006-01-04 | — | — | EP | claimed |
| US-20050277055-A1 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | FUJITSU LIMITED (JP) | 2005-12-15 | — | — | US | claimed |
| WO-2023219047-A1 | INSULATIVE ADHESIVE TAPE | 東洋インキＳＣホールディングス株式会社 | 2023-11-16 | — | — | WO | disclosed |
| CN-111377818-A | (meth) acrylate compound, polymer, resist material, and method for producing (meth) acrylate compound | 捷恩智株式会社 | 2020-07-07 | — | — | CN | disclosed |
| EP-3190138-B1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING SAME, AND COMPOSITION | THE SCHOOL CORPORATION KANSAI UNIV (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-10303051-B2 | Hyperbranched polymer, process for producing same, and composition | THE SCHOOL CORPORATION KANSAI UNIVERSITY (JP) | 2019-05-28 | — | — | US | disclosed |
| CN-109790405-A | Form the composition of dielectric film | 富士胶片电子材料美国有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-109388023-A | Photosensitive polymer combination, photosensitive resin coating, photosensitive dry film, lamilate and pattern forming method | 信越化学工业株式会社 | 2019-02-26 | — | — | CN | disclosed |
| US-9862695-B2 | Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound | DAICEL CORPORATION (JP) | 2018-01-09 | — | — | US | disclosed |
| US-20170283560-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING SAME, AND COMPOSITION | THE SCHOOL CORPORATION KANSAI UNIVERSITY (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20020169266-A1 | Polymeric compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-14 | — | — | US | disclosed |
| US-6440636-B1 | HIGH ETCHING RESISTANCE, TRANSPARENCY, ALKALI SOLUBILITY, AND ADHESION; ACRYLIC ESTERS HAVING ADAMANTANE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-27 | — | — | US | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-1172694-A1 | POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1172384-A1 | POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS | Daicel Chemical Industries, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |
| EP-1055654-A1 | PROCESS FOR THE PREPARATION OF ORGANIC COMPOUNDS WITH IMIDE CATALYSTS | Daicel Chemical Industries, Ltd. (JP) | 2000-11-29 | — | — | EP | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |