Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | TXNRD1 | Q16881 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | GSR | P00390 | 1/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | AR | P10275 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28296024 | 0.87 | ALDH1A1 (0.59) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL5135097 | 0.85 | HTT (0.49) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL27560084 | 0.85 | CYP1A2 (0.60) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL14411092 | 0.83 | ALDH1A1 (0.55) | HTTALDH1A1TSHRHPGDMAOB | |
| SCHEMBL8430876 | 0.82 | ALDH1A1 (0.55) | HTTALDH1A1TSHRMAPK1HPGD | |
| SCHEMBL244116 | 0.80 | ALDH1A1 (0.49) | HTTALDH1A1TSHRHPGDSIGMAR1 | |
| SCHEMBL1089020 | 0.80 | ALDH1A1 (0.51) | HTTALDH1A1TSHRHPGDMAOB | |
| SCHEMBL6175540 | 0.80 | ALDH1A1 (0.56) | HTTALDH1A1TSHRCYP2D6CYP2C19 | |
| SCHEMBL1534226 | 0.79 | ALDH1A1 (0.48) | HTTALDH1A1TSHRHPGDMAOB | |
| SCHEMBL27589225 | 0.79 | KMT2A (0.46) | HTTALDH1A1CYP2D6CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-101283462-B | Organic light emitting device having an intrinsic active layer and method of fabricating the same | GEN ELECTRIC | 2011-08-24 | — | — | CN | claimed |
| CN-101681096-A | Hardmask composition having antireflective properties and method of patterning material on substrate using the same | CHEIL IND INC | 2010-03-24 | — | — | CN | claimed |
| CN-101283462-A | Organic light emitting device having an intrinsic active layer and method of fabricating the same | GEN ELECTRIC (US) | 2008-10-08 | — | — | CN | claimed |
| CN-122025633-A | Polymeric adhesive for electrochemical cells including labels | 通用汽车环球科技运作有限责任公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20250231488-A1 | ANTI-REFLECTIVE COATING COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119882348-A | Resist underlayer composition and method for forming pattern using the same | 三星SDI株式会社 | 2025-04-25 | — | — | CN | disclosed |
| WO-2024254923-A1 | POLYMER FOR PHOTOETCHING MEDIUM COMPOSITION, AND PHOTOETCHING MEDIUM COMPOSITION | 嘉庚创新实验室 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024187508-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC DIELECTRIC COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC DIELECTRIC COMPOSITION | 嘉庚创新实验室 | 2024-09-19 | — | — | WO | disclosed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | disclosed |
| CN-1542546-A | Multilayer photoresist system | ϣ | 2004-11-03 | — | — | CN | disclosed |
| CN-1470946-A | Chemical-enlarging etchant material and patterning method using same | 富士通株式会社 | 2004-01-28 | — | — | CN | disclosed |
| US-20030125437-A1 | Polymers obtained from monomers allowing a sequential polymerization, and their use for preparing ionic conductors | MICHOT CHRISTOPHE (FR) | 2003-07-03 | — | — | US | disclosed |
| US-6492449-B2 | POLYMERS OBTAINED BY ANIONIC INITIATION AND BEARING FUNCTIONS THAT CAN BE ACTIVATED BY CATIONIC INITIATIONS THAT ARE NOT REACTIVE IN THE PRESENCE OF ANIONIC POLYMERIZATION INITIATORS. | HYDRO-QUEBEC (CA) | 2002-12-10 | — | — | US | disclosed |
| US-20020128364-A1 | POLYMERS OBTAINED FROM MONOMERS ALLOWING A SEQUENTIAL POLYMERIZATION, AND THEIR USE FOR PREPARING IONIC CONDUCTORS | HYDRO-QUEBEC (CA) | 2002-09-12 | — | — | US | disclosed |
| CN-1330779-A | Antireflective composition for deep ultraviolet photoresist | CLARIANT INT LTD (CH) | 2002-01-09 | — | — | CN | disclosed |
| CN-1300383-A | Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders | BREWER SCIENCE INC (US) | 2001-06-20 | — | — | CN | disclosed |
| CN-1292556-A | Dielectric composition | SIPRE CO (US) | 2001-04-25 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | HTT 3310/4885ALDH1A1 4156/4885TSHR 1838/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | HTT 3208/4885ALDH1A1 4640/4885TSHR 2568/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.