Diphenylsulfane

Diphenylsulfane

SCHEMBL5145134

CCCCc1ccccc1OS(=O)(=O)C(F)(F)F.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 8/20 0.40
DRD3 P35462 7/20 0.40
DRD4 P21917 5/20 0.40
DRD1 P21728 3/20 0.40
DRD5 P21918 3/20 0.40
HTR1D P28221 2/20 0.37
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37
HTR5A P47898 1/20 0.36
MGLL Q99685 1/20 0.36
PPARA Q07869 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2829914 0.92 DRD2 (0.44) DRD2DRD3DRD4DRD1DRD5
Iodide SCHEMBL9652564 0.91 DRD2 (0.44) DRD2DRD3DRD4DRD1DRD5
SCHEMBL10180973 0.88 THRA (0.47) DRD2DRD3DRD4DRD1DRD5
SCHEMBL8099840 0.87 THRA (0.49) DRD2DRD3DRD4DRD1DRD5
Iodide SCHEMBL6941466 0.85 THRA (0.48) DRD2DRD3DRD4DRD1DRD5
SCHEMBL4376769 0.83 DRD2 (0.46) DRD2DRD3DRD4DRD1DRD5
Iodide SCHEMBL8736525 0.81 DRD2 (0.41) DRD2DRD3DRD4DRD1DRD5
SCHEMBL14527534 0.80 DRD2 (0.43) DRD2DRD3DRD4DRD1DRD5
SCHEMBL13604212 0.79 DRD2 (0.46) DRD2DRD3DRD4DRD1DRD5
SCHEMBL10180862 0.77 THRA (0.45) THRATHRBMGLLPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1716450-A4 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES IBM (US) 2007-06-27 EP disclosed
EP-1716450-A1 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES International Business Machines Corporation (US) 2006-11-02 EP disclosed
WO-2005088393-A1 USE OF MIXED BASES TO ENHANCE PATTERNED RESIST PROFILES ON CHROME OR SENSITIVE SUBSTRATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-09-22 WO disclosed