SCHEMBL5145481

SCHEMBL5145481

[CH2]CC(=O)Oc1cccc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.56
HSD17B10 Q99714 3/20 0.56
GAA P10253 2/20 0.56
PGR P06401 1/20 0.56
PTGS1 P23219 1/20 0.56
MAPK1 P28482 1/20 0.56
KMT2A Q03164 4/20 0.55
L3MBTL1 Q9Y468 2/20 0.54
MEN1 O00255 2/20 0.54
RAB9A P51151 1/20 0.54
KDM4E B2RXH2 4/20 0.53
HPGD P15428 2/20 0.53
TDP1 Q9NUW8 1/20 0.53
MMP2 P08253 1/20 0.48
OGG1 O15527 1/20 0.47
FABP7 O15540 3/20 0.47
FABP3 P05413 3/20 0.47
FABP5 Q01469 3/20 0.47
BCHE P06276 1/20 0.47
SLC6A3 Q01959 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11370297 0.85 ALDH1A1 (0.59) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL10347205 0.85 ALDH1A1 (0.64) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL11716506 0.84 ALDH1A1 (0.57) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL5966176 0.84 ALDH1A1 (0.57) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL9844772 0.83 KMT2A (0.50) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL1034563 0.83 ALDH1A1 (0.53) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL25244833 0.82 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL448000 0.82 ALDH1A1 (0.60) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL8379770 0.82 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL10784906 0.82 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101124516-B Pattern forming material, pattern forming apparatus, and pattern forming method FUJI PHOTO FILM CO LTD 2012-01-18 CN disclosed
CN-101124516-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI FILM CORP (JP) 2008-02-13 CN disclosed
US-7161010-B2 Methine dyes; coloring compound FUJI PHOTO FILM CO., LTD. (JP) 2007-01-09 US disclosed
US-20070004923-A1 Methine compound and silver halide photographic material containing the same FUJI PHOTO FILM CO., LTD. 2007-01-04 US disclosed
EP-1061411-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-10-11 EP disclosed
EP-1067430-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-09-13 EP disclosed
CN-1273862-C Silver halide photographic emulsion and photosensitive material using said emulsion FUJI PHOTO FILM CO LTD (JP) 2006-09-06 CN disclosed
US-20050271987-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
CN-1221852-C Silver halide photographic emulsions and photographic sensitive material using same FUJI PHOTO FILM CO LTD (JP) 2005-10-05 CN disclosed
US-6838231-B2 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-04 US disclosed
CN-1320835-A Silver halide photographic emulsions and photographic sensitive material using same FUJI PHOTO FILM CO LTD (JP) 2001-11-07 CN disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
CN-1301982-A Silver halide photographic emulsion and photosensitive material using said emulsion FUJI PHOTO FILM CO LTD (JP) 2001-07-04 CN disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-1067430-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-01-10 EP disclosed
EP-1061411-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-20 EP disclosed
US-5885764-A SPECTRAL SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1999-03-23 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070004923-A1 Methine compound and silver halide photographic material containing the same PYM1, NPM1, METTL3 ALDH1A1 172/4885HSD17B10 3844/4885GAA 3792/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.