Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.31 |
| ▸ | TDP2 | O95551 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2331205 | 0.82 | ALDH1A1 (0.40) | MAPTRAB9AALDH1A1RXFP1 | |
| SCHEMBL12390085 | 0.75 | MEN1 (0.38) | MEN1KMT2AALDH1A1 | |
| SCHEMBL19116973 | 0.75 | MEN1 (0.38) | MEN1KMT2AALDH1A1 | |
| SCHEMBL73898 | 0.75 | MAPT (0.35) | MAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL10028356 | 0.74 | MAPT (0.40) | MAPTRAB9AMEN1KMT2AALDH1A1 | |
| SCHEMBL72629 | 0.73 | MAPT (0.38) | MAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL19117251 | 0.72 | MEN1 (0.36) | MEN1KMT2A | |
| SCHEMBL13113046 | 0.72 | MEN1 (0.36) | MEN1KMT2A | |
| SCHEMBL10012938 | 0.72 | MEN1 (0.36) | MEN1KMT2AALDH1A1 | |
| SCHEMBL72833 | 0.71 | ALDH1A1 (0.41) | MAPTRAB9AMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |