Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 4/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.49 |
| ▸ | MEN1 | O00255 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 2/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9669181 | 0.82 | HTT (0.55) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL29391544 | 0.80 | POLB (0.68) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL709788 | 0.80 | POLB (0.68) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL2199723 | 0.80 | ALDH1A1 (0.58) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL26622207 | 0.80 | HTT (0.53) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL10496198 | 0.79 | KMT2A (0.63) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL28409820 | 0.78 | POLB (0.65) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL701691 | 0.78 | SIRT1 (0.60) | HTTKMT2AGAAHPGDALDH1A1 | |
| SCHEMBL3078654 | 0.78 | HTT (0.51) | HTTKMT2AGAAHPGDALDH1A1 | |
| Hydrochloric Acid SCHEMBL6682455 | 0.78 | POLB (0.65) | HTTKMT2AGAAHPGDALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110806677-A | Photoresist composition, pattern forming method and application thereof | 常州强力先端电子材料有限公司 | 2020-02-18 | — | — | CN | claimed |
| US-6096836-A | OXYGEN CONTAINING AROMATIC CATALYST AND ALUMINUM COMPOUND | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-08-01 | — | — | US | claimed |
| US-5041567-A | Human and veterianary medicine; veneral diseases respiratory diseases, bovine mastitis | BEECHAM GROUP PLC (GB) | 1991-08-20 | — | — | US | claimed |
| WO-2023210623-A1 | HALOALKYL SULFONE ANILIDE COMPOUND AND HERBICIDE CONTAINING SAME | 株式会社エス・ディー・エス バイオテック | 2023-11-02 | — | — | WO | disclosed |
| US-20230194987-A1 | PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-06-22 | — | — | US | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-115650886-A | Oxime sulfonate photoacid generators and use of resist compositions | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-31 | — | — | CN | disclosed |
| CN-115611782-A | High-acid-production oxime sulfonate photoacid generator and application of resist composition thereof | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-115368285-A | Oxime sulfonate photo-acid generator with high acid yield | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115368287-A | I-line oxime sulfonate photo-acid generator with high acid yield | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115368340-A | Oxime sulfonate photoacid generators, resist compositions containing the same, electronic devices, and applications | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0633499-A1 | Radiation sensitive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |