SCHEMBL515192

SCHEMBL515192

[CH2]C(=C)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4829929 0.70
SCHEMBL515193 0.70
SCHEMBL11294895 0.70 ALDH1A1 (0.33)
SCHEMBL7940945 0.70
SCHEMBL1492004 0.70 THRB (0.33)
Ammonia Solution, Strong SCHEMBL4917394 0.67
SCHEMBL7722051 0.67
SCHEMBL1147760 0.67
SCHEMBL14306860 0.67
SCHEMBL8086513 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2807174-B1 MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION SIGMA ALDRICH CO LLC (US) 2016-03-30 EP disclosed
US-20150344404-A1 PDK4 INHIBITOR AND USE THEREOF THE KITASATO INSTITUTE (JP) 2015-12-03 US disclosed
EP-2939668-A1 PDK4 INHIBITOR AND USE THEREOF The Kitasato Institute (JP) 2015-11-04 EP disclosed
EP-2807174-A1 MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION Sigma Aldrich Co. LLC (US) 2014-12-03 EP disclosed
WO-2013112383-A1 MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION SIGMA-ALDRICH CO. LLC (US) 2013-08-01 WO disclosed
US-20120029219-A1 LOW ZIRCONIUM, HAFNIUM-CONTAINING COMPOSITIONS, PROCESSES FOR THE PREPARATION THEREOF AND METHODS OF USE THEREOF PRAXAIR TECHNOLOGY, INC. 2012-02-02 US disclosed
US-20060193979-A1 Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof PRAXAIR TECHNOLOGY, INC. 2006-08-31 US disclosed
US-20060062910-A1 Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof PRAXAIR TECHNOLOGY, INC. 2006-03-23 US disclosed
CN-1151769-C Hair cosmetic composition ������ѧ��ʽ���� 2004-06-02 CN disclosed
CN-1176094-A Hair cosmetic composition MITSUBISHI CHEM CORP (JP) 1998-03-18 CN disclosed
US-4444929-A Unsymmetrical phosphite-phenolic isocyanurate stabilizer combinations THE B. F. GOODRICH COMPANY (US) 1984-04-24 US disclosed