⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2611789 | 0.84 | HSD11B1 (0.31) | — | |
| SCHEMBL12197284 | 0.81 | ALDH1A1 (0.33) | — | |
| SCHEMBL9608685 | 0.81 | HSD11B1 (0.30) | — | |
| SCHEMBL7585184 | 0.81 | HSD11B1 (0.30) | — | |
| SCHEMBL26939202 | 0.80 | HSD11B1 (0.35) | — | |
| SCHEMBL19929339 | 0.80 | ALDH1A1 (0.35) | — | |
| SCHEMBL25509618 | 0.79 | HSD11B1 (0.35) | — | |
| SCHEMBL439022 | 0.79 | HSD11B1 (0.32) | — | |
| SCHEMBL19565069 | 0.79 | — | — | |
| SCHEMBL785874 | 0.79 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1149825-B1 | Ester compounds, polymers, resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-03-07 | — | — | EP | disclosed |
| US-6670498-B2 | Norbornene and dimethanonaphthalenes substituted with a branched or cyclic tertiary alkoxycarbonyl hydrocarbyleneoxycarbonyl group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-30 | — | — | US | disclosed |
| US-20030088115-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-08 | — | — | US | disclosed |
| US-6531627-B2 | Pendant ester groups on norbornene and 1,4:5,8-dimethanonaph-thalene backbone monomers, excellent reactivity; photosensitivity | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-03-11 | — | — | US | disclosed |
| US-20020007031-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1149825-A2 | Ester compounds, polymers, resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-10-31 | — | — | EP | disclosed |