Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25509618 | 0.84 | HSD11B1 (0.35) | HSD11B1 | |
| SCHEMBL439022 | 0.84 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL9608685 | 0.83 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL2611789 | 0.83 | HSD11B1 (0.31) | ALDH1A1HSD11B1 | |
| SCHEMBL4903389 | 0.83 | HSD11B1 (0.31) | ALDH1A1HSD11B1 | |
| SCHEMBL14839298 | 0.83 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL26939202 | 0.82 | HSD11B1 (0.35) | HSD11B1 | |
| SCHEMBL785874 | 0.81 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL19139315 | 0.80 | HSD11B1 (0.30) | ALDH1A1HSD11B1 | |
| SCHEMBL12197284 | 0.80 | ALDH1A1 (0.33) | ALDH1A1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-24 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-10975028-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-13 | — | — | US | disclosed |
| US-10915022-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-09 | — | — | US | disclosed |
| US-10838300-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-11-17 | — | — | US | disclosed |
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-15 | — | — | US | disclosed |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-08-18 | — | — | US | disclosed |
| US-20200064735-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-27 | — | — | US | disclosed |
| US-20190112265-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-04-18 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20180065925-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (13 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | HAX1, BRIX1, RXRA | ALDH1A1 2800/4885KMT2A 1657/4885SMN1; SMN2 2745/4885 |
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RIMKLA, GAR1, PCCA | ALDH1A1 93/4885KMT2A 2126/4885SMN1; SMN2 3574/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | ALDH1A1 492/4885KMT2A 2023/4885SMN1; SMN2 4386/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | ALDH1A1 4322/4885KMT2A 2745/4885SMN1; SMN2 3745/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | ALDH1A1 1692/4885KMT2A 521/4885SMN1; SMN2 2354/4885 |
| US-20190112265-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | HAX1, PRXL2A, CRY1 | ALDH1A1 3728/4885KMT2A 1142/4885SMN1; SMN2 2576/4885 |
| US-20230314939-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, HCAR1 | ALDH1A1 124/4885KMT2A 1333/4885SMN1; SMN2 4430/4885 |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | ALDH1A1 2800/4885KMT2A 1657/4885SMN1; SMN2 2745/4885 |
| US-10975028-B2 | Salt and photoresist composition containing the same | HAX1, PRXL2A, CRY1 | ALDH1A1 3728/4885KMT2A 1142/4885SMN1; SMN2 2576/4885 |
| US-10838300-B2 | Salt and photoresist composition containing the same | C1S, C1R, CRY1 | ALDH1A1 1698/4885KMT2A 1015/4885SMN1; SMN2 3246/4885 |
| US-20180065925-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, C1R, CRY1 | ALDH1A1 1698/4885KMT2A 1015/4885SMN1; SMN2 3246/4885 |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, H1-4, CHRM1 | ALDH1A1 1862/4885KMT2A 1203/4885SMN1; SMN2 3927/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | ALDH1A1 2788/4885KMT2A 654/4885SMN1; SMN2 3631/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.